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Nucleation and growth during the fo
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"Our ignorance is not so vast as ou
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Zusammenfassung Dünne Schichten au
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• Temperatureprofile mit hoher En
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3.2 In-situ optical microscopy . .
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1 Introduction ’Solar power is ho
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por deposition (PECVD) achieved par
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phous silicon interface layer is ex
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2 State of the art This chapter giv
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2.1 Kinetics of phase change 9 Figu
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2.1 Kinetics of phase change 11 [e
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2.2 Solid Phase Crystallization (SP
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2.2 Solid Phase Crystallization (SP
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2.3 Metal-Induced Crystallization (
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2.3 Metal-Induced Crystallization (
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2.3 Metal-Induced Crystallization (
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2.4 Aluminum-Induced Layer Exchange
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2.4 Aluminum-Induced Layer Exchange
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2.4 Aluminum-Induced Layer Exchange
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2.5 Current research involving ALIL
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2.5 Current research involving ALIL
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2.5 Current research involving ALIL
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2.5 Current research involving ALIL
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3 Experimental This thesis is focus
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3.1 Sample preparation 39 does not
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3.1 Sample preparation 41 � �
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3.2 In-situ optical microscopy 43 m
- Page 61 and 62: 3.2 In-situ optical microscopy 45 B
- Page 63 and 64: 3.3 Electron Back Scatter Diffracti
- Page 65 and 66: 4 Results In order to understand an
- Page 67 and 68: 4.1 Interlayer 51 (a) (b) Figure 4.
- Page 69 and 70: 4.1 Interlayer 53 Figure 4.2: TEM c
- Page 71 and 72: 4.1 Interlayer 55 c o u n ts [a .u
- Page 73 and 74: 4.1 Interlayer 57 R C [% ] 1 0 0 8
- Page 75 and 76: 4.1 Interlayer 59 � � ���
- Page 77 and 78: 4.1 Interlayer 61 � � ���
- Page 79 and 80: 4.1 Interlayer 63 -2 ] N G [m m 8 6
- Page 81 and 82: 4.1 Interlayer 65 TA = 450 °C TA =
- Page 83 and 84: 4.1 Interlayer 67 (111) (100) (110)
- Page 85 and 86: 4.1 Interlayer 69 4.1.2 Molybdenum
- Page 87 and 88: 4.1 Interlayer 71 Fig. 4.17 optical
- Page 89 and 90: 4.1 Interlayer 73 R C [% ] 1 0 0 8
- Page 91 and 92: 4.2 Temperature profiles 75 face la
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- Page 95 and 96: 4.2 Temperature profiles 79 R C [%
- Page 97 and 98: 4.2 Temperature profiles 81 a small
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- Page 101 and 102: 4.2 Temperature profiles 85 (a) (b)
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- Page 107 and 108: 4.2 Temperature profiles 91 ��
- Page 109 and 110: 4.2 Temperature profiles 93 in. Thu
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- Page 115 and 116: 5.1 Definition of three crucial Si
- Page 117 and 118: 5.1 Definition of three crucial Si
- Page 119 and 120: 5.1 Definition of three crucial Si
- Page 121 and 122: 5.1 Definition of three crucial Si
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- Page 125 and 126: 5.2 The ALILE process in the phase
- Page 127 and 128: 5.2 The ALILE process in the phase
- Page 129 and 130: 5.3 Depletion regions in the ALILE
- Page 131 and 132: 5.4 Comparison of the qualitative m
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- Page 137 and 138: 5.5 Preferential orientation model
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- Page 145 and 146: 6 Conclusions In the aluminum-induc
- Page 147 and 148: A Preferential orientation calculat
- Page 149 and 150: The area of the base of the pyramid
- Page 151 and 152: B Abbreviations, symbols and units
- Page 153 and 154: symbol unit meaning ∆G a eV activ
- Page 155 and 156: Bibliography [1] M. Rogol, S. Doi,
- Page 157 and 158: [20] R.W. Bower, R. Baron, J.W. May
- Page 159 and 160: [38] J. Jang, J.Y. Oh, S.K. Kim, Y.
- Page 161 and 162: [58] N.-P. Harder, T. Puzzer, P. Wi
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[72] G. Ekanayake, S. Summers, and
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[87] H.R. Philipp and E.A. Taft. An
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list of publications journal papers
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B. Rau, J. Klein, J. Schneider, E.
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(2002), 87. S. Gall, M. Muske, I. S
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tion. Special thank’s go to Dr. M
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10/95-09/98 student electrical engi