Atomic Layer Deposition (ALD): An Enabler for Nanoscience and ...

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Usefulness of Precursors for CVD & ALD Some precursors work only in CVD, but not ALD: Ni(CO) 4 , W(CO) 6 , many alkoxides Some precursors work in both CVD and ALD: many beta-diketonates and amidinates Most ALD precursors also work in CVD Some CVD precursors also work in ALD Harvard University CVD ALD
Definitions of Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) Structures and materials made by ALD Properties needed for CVD and ALD precursors: Volatility, Stability, Reactivity How to design those properties into precursors: metal amidinates High-k insulators: La 2 O 3 , LaAlO 3 Harvard University Outline
Page 1 and 2: Atomic Layer Deposition (ALD): An E
Page 3 and 4: Chemical Vapor Deposition (CVD) One
Page 5 and 6: ML 2 H 2O Typical ALD Reaction for
Page 7 and 8: Lining and Filling Holes by ALD Har
Page 9 and 10: Coatings on the Outside of Particle
Page 11 and 12: ALD ruthenium on aluminum oxide dia
Page 13 and 14: Alumina Nanotubes on Carbon Nanotub
Page 15 and 16: Elements included in ALD Materials
Page 17 and 18: Pure Elements Made by ALD Green = A
Page 19 and 20: Harvard University Sulfides Made by
Page 21 and 22: Harvard University Fluorides Made b
Page 23 and 24: Definitions of Chemical Vapor Depos
Page 25: Criteria for CVD Precursors •Reac
Page 29 and 30: Increasing ligand bulk Structures o
Page 31 and 32: Increasing ligand bulk Structures o
Page 33 and 34: Zr(amd) 4 and Hf(amd) 4 Harvard Uni
Page 35 and 36: Harvard University Thermogravimetri
Page 37 and 38: Precursors: H 2 O and Harvard Unive
Page 39 and 40: Precursors: Me 3 Al, H 2 O and Harv
Page 41 and 42: 2 nm TEMs of ALD LaAlO 3 and GdScO
Page 43 and 44: Leakage (A/cm 2 ) 10 2 10 0 10 -2 1
Page 45: Harvard University Acknowledgements

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