Atomic Layer Deposition (ALD): An Enabler for Nanoscience and ...
Atomic Layer Deposition (ALD): An Enabler for Nanoscience and ...
Atomic Layer Deposition (ALD): An Enabler for Nanoscience and ...
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Leakage (A/cm 2 )<br />
10 2<br />
10 0<br />
10 -2<br />
10 -4<br />
10 -6<br />
10 -8<br />
Harvard University<br />
Comparison of leakage<br />
SiO 2<br />
<strong>ALD</strong> LaAlO 3<br />
<strong>ALD</strong> GdScO 3<br />
0.5 1.0 1.5 2.0 2.5 3.0 3.5 4.0<br />
EOT (nm, |V g -V fb |=1V)<br />
<strong>ALD</strong> LaScO 3<br />
<strong>ALD</strong> HfO 2 from IMEC (Ref.1)<br />
MOCVD HfO 2 from IMEC (Ref.2)<br />
<strong>ALD</strong> HfO 2 from IBM (Ref.3)<br />
Sputter HfO 2 (Ref.4)
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