Vacuum Catalogue - Edwards

STPA1603C Turbomolecular Vacuum Pump2Page102The small and powerful Edwards STPA1603C turbo-molecular pump has been designedusing Edwards advanced rotor technology. This provides high throughput, maximumreliability and class leading performance which is demanded by the latest generation ofsemiconductor processes. Its half rack controller and compact design provide considerablespace saving, whilst its advanced deposition reduction system gives improved reliability andperformance. The STPA1603C has been qualified on the latest 200 mm etch tools as wellas on new generation 300 mm oxide etch processes.Features & Benefits●●●●●Advanced rotor designIncreased performanceHigher gas throughputHigh reliabilityMaintenance freeDimensionsApplications●●●●●Plasma etch (chlorine, fluorine and bromine chemistries) formetal (aluminum), tungsten and dielectric (oxide) and polysiliconElectron cyclotron resonance (ECR) etchFilm deposition CVD, PECVD, ECRCVD, MOCVDSputteringIon implantation source, beam line pumping end stationPerformance Curves1. 1600 ls -1 Ar2. 1600 ls -1 N 2 3. 1200 ls -1 H 2A Electrical connector B Outlet port C Purge portD Cooling water out E Cooling water inShop online at www.edwardsvacuum.com