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Vacuum Catalogue - Edwards

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STP-L301 Turbomolecular <strong>Vacuum</strong> Pump<strong>Edwards</strong> corrosion resistant STP-L301(C) is for use in electron microscopes andsemiconductor applications. <strong>Edwards</strong> rotor technology gives class-leading performance formaximum process flexibility.2Page88The STP-L301(C) has been approved for use by major equipment manufacturers in thescientific instrument, semiconductor and magnetic media industries.Features & Benefits●●●●●Advanced rotor technologyMaximized process flexibilityOil freeLow vibrationHigh reliabilityDimensionsApplications●●●●●Plasma etch (chlorine, fluorine and bromine chemistries) formetal (aluminum), tungsten and dielectric (oxide) and polysiliconElectron cyclotron resonance (ECR) etchFilm deposition CVD, PECVD, ECRCVD, MOCVDSputteringIon implantation source, beam line pumping end stationPerformance Curves1. N 22. He3. H 2A. Connector B. Outlet portShop online at www.edwardsvacuum.com

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