Vacuum Catalogue - Edwards

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Exhaust Management for Semiconductor Processes7Page272Comprehensive RangeEdwards is unique in offering the broadest range of exhaustmanagement technologies, demonstrated in a series of products andsystems designed to meet all customer requirements – from low-costfacility management to full environmental protection. We arecommitted to supplying exhaust management systems that matchcustomer specific application requirements. We strive to minimisecost of ownership while introducing innovative designs to achievegreater reliability, longer service intervals, reduced space and utilitiesrequirements and lower waste emissions.Leading-Edge ManufacturingOur primary manufacturing facility is located at Clevedon in the UK.The site comprises a factory with flexible production lines, assemblyfeed cells, just-in-time manufacturing techniques and one of thelargest exhaust management research centers in the world.Additional manufacturing sites located at Chunan (Korea) and Ina(Japan) complement the global production capability. Underpinningour whole operation is a commitment to quality and world classmanufacturing standards. An ISO 9001 and ISO 14001 managementsystem, supported by TQM and Kaizen methodologies, is at the coreof the operation. Product certification to the relevant internationalstandard is conducted by ITS, the independent external test house.Thermal ProcessingEffective exhaust management of CVD processes must be able tohandle the deposition gases and the associated powders. Thefluoride wastes from cleaning gases also require suitable treatmentalong with the global warming gases. Abatement systems must beable to comply with these requirements in one complete unit.The TPU (Thermal Processing Unit) is the industry standardabatement system for CVD. One model is suitable for all CVD andmany etch applications. Each inlet can be configured for high levelabatement of all Global Warming PFC gases, F 2 or CIF 3 . The TPUcan accommodate total input flows up to 280 slpm.Where PFCs are not used, the TCS (Thermal Conditioning System)provides a cost-effective means of handling both hazardous fluoridewaste and deposition gases.The Helios is an advanced solution for the abatement of highhydrogen flows designed to handle both toxic and carrier gases fromLow Pressure Epitaxy and MOCVD processes.Atlas The Atlas range is the lastest addition to the inward firedcombustor range available in TPU, TCS and Kronis variants, therange offers the same excellent performance with added benefits ofreduced utilities and cost of ownership savings as standard.The Kronis provides effective treatment for low k CVD processexhausts.The HOx (Hot Oxidation System) offers an innovative electricalheated oxidation unit and the proven three-stage wet scrubber of thecombustor product line, it combines superior performance for theabatement of CVD processes in facilities which do not have the abilityto use fuel gas.Gas Reactor ColumnsEdwards offers a range of low-cost, point-of-use dry abatementsystems for semiconductor processing. Each system uses the uniquehot bed reactor technology developed for the GRC (Gas ReactorColumn) range. The Inline 250 is the highest performance of any dryabatement technology for etch exhausts. It provides treatment bychemical reaction to stable inert salts and treats the widest range ofgases from halogens and acids to CIF 3 , NF 3 , SF 6 and other halideetch compounds. The D150 Dual GRC provides dual-cartridgeoperation thus minimising the cost of ownership with 100% uptime.The M150 Single GRC is a compact dry gas treatment system forremoving hazardous etch and CVD emissions at the source,converting them into harmless solids within an easily changed anddisposable cartridge.Wet ScrubbersEdwards new range of wet scrubbers provide exhaust managementat minimal cost for preservation of assets and regulatory compliance.Tempest is a point of use wet scrubber suitable for the treatment ofsemiconductor process tool exhausts containing water-soluble andwater-reactive gases such as HCl, Cl 2 and NH 3 .Pyrophoric ConditioningFor the removal of silane and pyrophoric gases to below lowerexplosion level (LEL) the PCS (Pyrophoric Conditioning System)offers an advanced solution. Specifically designed for the safehandling of silane, the PCS incorporates a unique particle handlingsystem to keep ducts free from powders.Integrated Vacuum and Exhaust ManagementSystemsVacuum equipment and exhaust management devices aretraditionally installed side-by-side, beneath the process tool. TheZenith range now offers a series of process-specific, fully integratedvacuum pump and exhaust management systems designed to safelyhandle the process exhausts from a wide range of applications.Enhanced safety, process tool compatibility, minimum footprint andreduced cost of ownership are key benefits derived from our uniqueapproach, resulting in improved uptime, process efficiency andprofitability.TMS Temperature Management SystemEdwards offers TMS (Temperature Management System) forprocesses involving condensable byproducts. TMS ensures thatthese compounds remain volatile until they enter the abatementdevice. The TMS is designed to heat both forelines and pumpexhaust lines to the inlet of the abatement device. Moulded highsurface area heaters maximize contact with pipes and are designedto maintain the temperature of the pipe between 90° and 150 °C. TMSmonitoring is available as an option to provide both local and remoteverification that the line is at a sufficient temperature. TMS has beensuccessfully used in conjunction with the entire range of Edwardsexhaust management equipment to alleviate the problems historicallyassociated with solid deposition and corrosion.Product SelectionUsing our product selection guide customers have the opportunity todecide which Edwards point-of use abatement equipment is mostsuitable for their particular application on the basis of their exhaustgas management goals. Edwards will provide their experience andexpertise to specify the exhaust management product for the chosenapplication.GRC technology has been used to abate the exhaust gas streamson a wide range of semiconductor applications. (Photographcourtesy of TI, Dallas, USA.)Shop online at www.edwardsvacuum.com
Product Selection GuideVacuumPROCESS GASES ISSUES Zenith Fuel Non Fuel ExhaustManagementGXiHTMSWESPWCTPCSGANCATGRC M150i250TEMPESTMISTRALHOXSPECTRA GSPECTRA ZKRONIS /ATLASHeliosTPU /ATLAS TPUTCS /ATLAS TCSIII-VEPIETCHCVD● ● ▲ ▲ ▲Corrosive and toxic by-productsHigh use of global warming PFC gasesETCH Dielectric CHF 3 /NF 3 /CF 4 /C 2 F 6 /C 4 F 8 /SF 6 /C 4 F 6 /C 5 F 8 /CH 3 F● ● ▲ ▲ ▲ ▲● ● ▲ ▲ ● ▲Conductive – poly silicon Cl 2 /HBr/ SF 6 /CF 4 /CHF 3 Toxic and corrosive by-productsUse of global warming PFC gasesConductive – metal Cl 2 /BCl 3 /CF 4 /CHF 3 Exhaust blockages from condensing vapoursToxic and corrosive by-productsSiH 4 /NH 3 /N 2 O/ PH 3 /SiF 4 Flammable/incompatible gas mixtureswith PFC clean Very high use of global warming PFC gases ● ● ▲ ▲ ▲ ▲with NF 3 clean Use of global producedwarming PFCs, high quantities of fluorine● ● ● ▲ ▲PECVD Silane-based oxide/nitride/HDPTEOS based oxide/BPSG TEOS/TEB/TEP Flammable/incompatible gas mixturesLiquid sources can condensewith PFC clean Very high use of global warming PFC gases ● ● ▲ ▲ ● ▲with NF 3 clean Use of global producedwarming PFCs, high quantities of fluorine● ● ● ● ▲● ● ▲ ● ▲Low k CVD 3MS/4MS/TMCTS Flammable/incompatible gas mixturesLiquid sources can condensewith NF 3 clean Use of global warming PFCs, high quantities of fluorineproducedCVD Metalisation – tungsten SiH 4 /WF 6 /H 2 Flammable/incompatible gas mixturesClean step with PFC clean Very high use of global warming PFC gases ● ● ▲ ● ▲with NF 3 clean Use of global warming PFCs high quantities of fluorineproduced● ● ● ● ▲ ● ▲with CIF 3 clean Highly toxic/corrosive gas used ● ● ● ▲ ●Metalisation – titanium TiCl 4 /NH 3 /ClF 3 /CI 2 Flammable/incompatible gas mixturesHighly toxic/corrosive gases used● ● ● ▲ ▲ ● ▲High k CVD High k precursors ● ● ● ▲ ▲ ▲LPCVD Polysilicon SiH 4 /PH 3 /AsH 3 Highly toxic/flammable gases usedClean step none ● ● ● ▲ ▲ ▲with F 2 /HF Highly toxic/corrosive incompatible gases used sequentially ● ● ● ▲ ▲with CIF 3 ● ● ● ▲ ▲LPCVD Nitride HCD/DCS/NH 3 Highly toxic/flammable gases usedClean step None ● ● ▲ ▲ ▲ ● ▲with F 2 /HF Highly toxic/corrosive incompatible gases used sequentially ● ● ● ▲ ● ▲EPITAXY Low pressure EPI H 2 /DCS/PH 3 /SiH 4 / AsH 3 /B 2 H 6 / Very high flows of explosive gas usedGeH 4/HCI Highly toxic/flammable and corrosive gases used● ● ▲IMPLANT BF 3 /PH 3 /AsH 3 Highly toxic/flammable gases used ▲ ▲MOCVD Phosphide H 2 /AsH 3 /PH 3 /TMG/TMA/TMI Highly toxic gases used● ● ▲ ● ▲Exhaust blockages from condensing vapoursVery high flows of explosive gas used● ● ● ▲Nitride N 2 /H 2 /NH 3 /TMG/TMA/TMI Highly toxic gases usedVery high flows of explosive gas usedEtch H 2 /O 2 /CF 4 /CI 2 /HCI/He/SF 6 Highly flammable/corrosive gases used● ● ▲ ▲Exhaust blockages from solids formationUse of global warming PFC gasesCVD SiH 4 /NH 3 /NF 3 /F 2 /SF 6 Pyrophoric and flammable gases usedFLAT PANELDISPLAY &SOLAR CELL● ● ▲ ▲ ▲Corrosive gases usedSolids management required● Full environment safety and health management ▲ Health safety and capital asset protectionATLAS CVD ETCH EPI ERIX III-V TPU TCS Helios Kronis Spectra Z Spectra GHOX Mistral Tempest i250 GRC M150 GANCAT PCS WCT WESP TMS iH GX7Page273Shop online at www.edwardsvacuum.com
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PRODUCT CATALOGUE2012
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ContentsSmall Wet/Dry PumpsTurbomol
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Small Pumps and Pumping Systems1Pag
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Small Pumps and Accessories: Freque
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1Page6Technical DataNominal rotatio
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1Page8Technical DataNominal rotatio
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1Page10Technical DataNominal rotati
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1Page12Technical DataNominal rotati
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XDS35i Scroll Vacuum Pump1Page14The
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XDS46i Scroll Vacuum Pump1Page16The
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Technical DataOrdering InformationP
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E2M0.7 Two Stage Rotary Vane PumpTh
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E2M1.5 Two Stage Rotary Vane PumpTh
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RV3 Two Stage Rotary Vane PumpEdwar
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RV12 Two Stage Rotary Vane PumpEdwa
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E1M18 One Stage, E2M18 Two Stage Ro
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E2M28 Two Stage Rotary Vane PumpThe
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RV ATEX Two Stage Rotary Vane PumpA
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E1M18 One Stage, E2M18 Two Stage AT
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Electrical DataSmall Pump Accessori
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Ordering InformationProduct Descrip
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Vibration IsolatorsYou may need to
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Performance Curves1. D-LAB 34-100 2
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Turbomolecular Pumps2Page51nEXT Tur
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VentingTo maintain the cleanliness
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Technical DataInlet flangeDN100ISO-
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Technical DataOrdering InformationI
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Technical DataOrdering InformationM
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Technical DataMax input Power240WMa
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Technical DataPump / TIC powerEXT75
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Vibration IsolatorA vibration isola
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Technical DataPumping Speed for N 2
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STP Magnetically Levitated Turbomol
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STPs and the EnvironmentReducing En
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Technical DataInlet flange sizeVF30
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Vapour Pumps3Page117High Throughput
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Vapour Pumps for Industrial Applica
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Technical DataOrdering InformationC
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Ordering informationProduct descrip
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250/2000 Installation3711163P10**5P
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Notes3Page135Shop online at www.edw
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Measurement & Control4TIC Instrumen
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The Active Gauge Concept• Operate
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Technical DataElectrical DataConnec
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Technical DataOrdering InformationE
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Technical DataActive gauge compatib
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Technical DataMass85 gInternal volu
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Technical DataATC-E Electronics Mod
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Technical DataFull scale pressure r
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Technical DataFull scale pressure r
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Technical DataPressure RangeAIM-X10
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Technical DataPressure rangeAccurac
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CG16K dial gaugeEdwards CG16K capsu
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VS16K Adjustable Vacuum SwitchThe V
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Vacuum ValvesSpeedivalves 169Ball V
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SpeedivalveEdwards SP Speedivalves
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IBV series vacuum ball valvesBall v
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PVMK Manual Operation Right Angle I
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PVPK Pneumatic Operation Right Angl
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IPVPK Pneumatic Operation In-Line I
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PVEK Solenoid Operation Right Angle
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IPVEK Solenoid Operation In-Line Is
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LCPVEK Solenoid Operation Isolation
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LCPVEK Solenoid Operation Isolation
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BRV Backing/Roughing ValveEdwards b
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SIPVP Soft-Start Isolation ValvesSo
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BGV Manual Gate ValvesThe BGV basem
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BGV Pneumatic Gate ValvesThe BGV ba
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GV Manual and Pneumatic Gate Valves
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QSB Quarter Swing Butterfly ValveTh
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AV5A Air Admittance Valve With Coup
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LV10K Leak Valve NW10 FlangesThe LV
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Technical DataValveGV gate valvesPV
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Fittings and FlangesProduct Summary
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CF Flange Names There are many desc
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DimensionsNW Dimensions2.5ØAØBISO
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NW fittingsSize A B C D E F Orderin
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Size A B C D E F Ordering NumberNit
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Size A B C D E F Ordering NumberAEl
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Size A B C D E F Ordering NumberAFu
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Size A B C D E F Ordering NumberABA
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Page 227 and 228: ISO fittingsSize A B C D E F Orderi
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Page 231 and 232: Size A B C D E F Ordering NumberBAT
Page 233 and 234: Size A B C D E F Ordering NumberABF
Page 235 and 236: Size A B C D E F Ordering NumberACD
Page 237 and 238: Size A B C D E F Ordering NumberElb
Page 239 and 240: Size A B C D E F Ordering NumberDAB
Page 241 and 242: Size A B C D E F Ordering NumberAC
Page 243 and 244: Oils, Fluids, Sealants and GreasesW
Page 245 and 246: Mechanical Pump Oil Selection Chart
Page 247 and 248: Vapour Pump FluidsEdwards supplies
Page 249 and 250: Greases and WaxesGreases and waxesS
Page 251 and 252: Semiconductor PumpsiXL Dry Pumps 24
Page 253 and 254: Technical DataProductiXL120Peak spe
Page 255 and 256: Technical DataPeak speedUltimate va
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Page 271 and 272: Technical DataPerformancePeak speed
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Page 279 and 280: Industrial Pumps and Pumping System
Page 281 and 282: EV Oil Sealed Single Stage Rotary V
Page 283 and 284: GXS industrial Dry Screw PumpDesign
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Page 293 and 294: Technical DataOrdering InformationD
Page 295 and 296: Technical DataMass IDX1000 IDX13005
Page 297 and 298: ITM High Capacity Inlet Dust Filter
Page 299 and 300: Technical DataDisplacement50Hz 42.5
Page 301 and 302: Technical DataDisplacement50Hz 80 m
Page 303 and 304: Technical DataDisplacement50Hz 178
Page 305 and 306: Technical DataDisplacement50Hz 292
Page 307 and 308: Vibration IsolatorsYou may need to
Page 309 and 310: Ordering Information - All Territor
Page 311 and 312: Stokes Microvac Series Oil Sealed R
Page 313 and 314: Stokes Microvac Model 412JThe Stoke
Page 315 and 316: Stokes Microvac Model 912JThe Stoke
Page 317 and 318: Oil Reservoir HeaterEdwards model 2
Page 319 and 320: MB/MV Series VerticallyOriented Boo
Page 321 and 322: Stokes 612MB Multi-Stage Pumping Sy
Page 323 and 324: Stokes 1721 Mechanical Booster Pump
Page 325 and 326: Stokes 1722 Mechanical Booster Pump
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Stokes 1733 Mechanical Booster Pump
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Stokes 1733HD Mechanical Booster Pu
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Stokes 1738BP Mechanical Booster Pu
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Stokes 1738 HCBP Mechanical Booster
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Stokes 1738HDBP Mechanical Booster
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Stokes 1739BP Mechanical Booster Pu
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Stokes 1739HCBP Mechanical Booster
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Stokes 1739HDBP Mechanical Booster
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Stokes 1754HC Mechanical Booster Pu
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EV40 Oil Sealed PumpThe EV rotary v
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EV100 Oil Sealed PumpThe EV rotary
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EV200 Rotary vane pumpThe EV rotary
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EV400 Rotary vane pumpThe EV rotary
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Accessories for Single Stage Oil Se
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EH Mechanical Booster PumpsBroad Ap
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EH250 Mechanical Booster PumpThe EH
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EH500 Mechanical booster pumpThe EH
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EH1200 Mechanical booster pumpThe E
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Mechanical Booster Pump Accessories
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Stokes 607 Series Mechanical Booste
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Stokes 61B Series By-Pass Mechanica
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HV8000 Mechanical booster pumpThe E
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HV30000 Mechanical Booster PumpThe
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Chemical Dry PumpsCXS Chemical dry
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CXS Chemical Dry Screw PumpDesigned
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CXS160 chemical dry pumpEdwards pio
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CXS250 chemical dry pumpEdwards pio
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CDX1000 Dry Vacuum PumpEdwards CDX1
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EDP80 - Dry Chemical PumpsEDP pumps
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EDP160 - Dry Chemical PumpsEDP pump
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Liquid Ring PumpsHR Series Liquid R
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ApplicationsSome of the more common
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Liquid Ring Pump Applications in Po
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Features & Benefits• Two stage li
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Exhaust Gas Treatment ApplicationsT
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EHR2390 Liquid Ring PumpWithin Edwa
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SHR2750 Liquid Ring PumpWithin Edwa
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SHR21200 Liquid Ring PumpWithin Edw
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SHR22500 Liquid Ring PumpWithin Edw
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LR1A300 Liquid Ring PumpEdwards off
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LR1A1300 Liquid Ring PumpEdwards of
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LR1A12000 Liquid Ring PumpEdwards o
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LR1B3500 Liquid Ring PumpEdwards of
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LR1B11000 Liquid Ring PumpEdwards o
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Shelf Dryers11Page449Shop online at
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Data Summary Stokes Vacuum Shelf Dr
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Process Vacuum12Page453Shop online
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Deaeration EquipmentMultistage Ejec
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Boiler Feedwater and Process Water
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ServiceGuide to Pump Selection and
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Certified ProductsEdwards Certified
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Guide to Pump Selection and Pipe In
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Effect of the Pipe Between the Seco
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Material Safety Data SheetsThe foll
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RoHS ComplianceThe EU RoHS (Restric
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Vacuum Catalogue - Edwards

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