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Tellurite And Fluorotellurite Glasses For Active And Passive

Tellurite And Fluorotellurite Glasses For Active And Passive

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7. Surface properties; MDO 299<br />

Again, 3M HCl was a poor etchant, producing heavy pitting. Fig. (7.31) shows the etch<br />

rates of glasses MOF001 (65TeO2-10Na2O-25ZnF2 mol. %) in 3M HCl and MOF005<br />

(70TeO2-10Na2O-20ZnF2 mol. %) in 1M HCl, both at 21°C whilst agitated.<br />

Wt. loss / %<br />

Wt. loss / %<br />

40<br />

35<br />

30<br />

25<br />

20<br />

15<br />

10<br />

5<br />

MOF001 3M HCl<br />

y=38.39-35.33315exp(-x/1.60971)<br />

R 2 = 0.97711<br />

MOF005 1M HCl<br />

y=3.03447x<br />

R 2 = 0.97502<br />

0<br />

0 1 2 3 4 5<br />

40<br />

30<br />

20<br />

10<br />

MOF001 3M HCl<br />

y=17.96321x<br />

R 2 =0.98566<br />

MOF005 1M HCl<br />

y=5.59035x<br />

R 2 =0.97733<br />

Time / min.<br />

(a)<br />

0<br />

0.0 0.5 1.0 1.5 2.0 2.5<br />

(t) 1/2 / (min.) 1/2<br />

(b)<br />

Fig. (7.31): Etch rates of glasses MOF001 (65TeO2-10Na2O-25ZnF2 mol. %) in 3M HCl<br />

(■) and MOF005 (70TeO2-10Na2O-20ZnF2 mol. %) in 1M HCl (●), both at 21°C whilst<br />

agitated, plotted against: (a) time, and (b) (time) 1/2 .

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