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Tellurite And Fluorotellurite Glasses For Active And Passive

Tellurite And Fluorotellurite Glasses For Active And Passive

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7. Surface properties; MDO 318<br />

Table (7.8): Proposed regimes of water attack on fluorotellurite glasses.<br />

Temperature regime Main reactions Comments<br />

High T<br />

(≈ 60°C)<br />

Low T (≈ 21°C) -Zn + F - + H + OH - -Zn-OH + H + F - F - / OH - exchange<br />

≡Te-O-Te≡ + H + OH - 2(≡Te-OH) Bridging bond severance<br />

≡Te-O-Na + + H + OH - ≡Te-OH + Na + OH - Cationic leaching<br />

The leaching of sodium ions and severance of Te-O-Te bonds could take place at around<br />

a 1:1 ratio at lower temperatures and the weight loss and gain would approximately<br />

cancel each other out (RAMNa = 23.0 g.mol -1 , and RMMH2O = 18.0 g.mol -1 ), with little<br />

effect seen on the durability curve, fig. (7.29a). If this was the case, higher temperature<br />

leaching also occurs with sodium ions, as well as heavier cations, i.e. tellurium and zinc.<br />

The durability curves levelled out eventually, perhaps as an impermeable hydroxide layer<br />

will form, protecting the material away from the surface hydrolysing further. Fig. (7.29b)<br />

shows the weight loss from (fig. 7.29a) plotted against (t) 1/2 . <strong>For</strong> both temperatures, 21<br />

and 60°C, the plot was highly linear, suggesting diffusion controlled attack of the<br />

fluorotellurite glass by the water.<br />

Fig. (7.30) shows the surface quality of glass MOF001 (65TeO2-10Na2O-25ZnF2 mol.<br />

%) after immersion in 3M HCl, with agitation at 21°C. These glasses exhibited different<br />

surface morphology after etching to the oxide glasses reported in the previous section.<br />

Initially (30 sec.) the spherical pitting was relatively smooth, but after 1 min. the surface<br />

quality became very poor. Fig. (7.31a) shows the exponential etch rate of this solution,<br />

and the linear etch rate (≈ 3 wt. % per min.) of the 1M solution on glass MOF005<br />

(70TeO2-10Na2O-20ZnF2 mol. %). This pronounced pitting may be due to the<br />

preferential attack of TeO2 / Na2O / ZnO, leaving more fluoride material, etched at a

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