CHEM02200704003 Nilamadhab Pandhy - Homi Bhabha National ...

Chapter 3
phase, (2) enhances passivation property in aggressive solutions, (3) provides beneficial effects
from intergranular and pitting corrosion, (4) increases hardness, friction coefficient, load bearing
capacity and wear behaviour, and (5) improves fatigue resistance and cavitation corrosion
behaviour [38, 51-54].
Ion implantation is generally carried out by accelerators consisting of an ion source where
ions of the desired element are produced, an accelerator where the ions are accelerated to high
energy, and a target chamber where the ions impinge on the target which is the material to be
implanted. A schematic of ion implantation process is shown in Fig. 3.1 [55].
Fig. 3.1: Schematic of ion implantation using accelerator [55].
Ion sources are the most important component of ion implantation equipment, and almost
all the sources (hallow cathode ion source, penning discharge ion source etc) [56] produce ions by
means of confined electrical discharge which is sustained by gas or vapour of the material to be