Wüest M. 51 Wykes M. 82 Yamaguchi M. 17 Ybarra G. 129 Yubero F ...

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JUNE 26 MONDAY MORNING RIVA-TF-MoM-OR.7 INFLUENCE OF THE YTTRIUM CONTENT ON THE ME- CHANICAL PROPERTIES OF Y 2 O 3 -ZrO 2 THIN FILMS PREPARED BY EB – PVD. I. M. Ochando. Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Científicas. Cantoblanco, 28049 – Madrid, Spain. D. Cáceres. Departamento de Física, Universidad Carlos III de Madrid, E-28911 Leganés, Spain. F. J. García-López. Centro Nacional de Aceleradores, Parque Tecnológico Cartuja’93, 41092 – Sevilla, Spain. R. Escobar-Galindo, R. J. Jiménez-Rioboó and C. Prieto. Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Científicas. Cantoblanco, 28049 – Madrid, Spain. Zirconium oxide is a widely used material because of its heat resistance, low thermal conductivity, high refractive index and high transparency in the visible and near infrared region, very high chemical inertness and high laser damage threshold. Due to these properties, its applications can be found in very different aspects of technology. For instance, zirconia has been applied as thermal barrier coating (TBC)], optical filters, laser mirrors], oxygen sensors], and solid oxide fuel cells]. TBC’s based on yttria stabilized zirconia (YSZ) films prepared by electron beam physical vapour deposition (EB-PVD) are candidates for advanced thermal barrier coatings for the new generation of land-based gas turbines because of the different obtained microstructure respect to other deposition techniques. The low thermal conductivity magnitude for the films is mainly due to two factors: the film microstructure and the intrinsic thermal conductivity value. For YSZ system, this second factor is related with the oxygen defect structure which is induced when Zr 4+ ions are substituted with trivalent Y 3+ ions giving rise to oxygen vacancies to compensate electrical charge. Undoubtedly, mechanical properties are of significant importance for TBC and optical applications. In this work, we present a nanoindentation characterization, where hardness and Young modulus have been obtained for a set of (Y 2 O 3 ) x -(ZrO 2 ) 1-x thin films prepared by EB-PVD on Si(100) substrates, in order to study the hardness dependence on the yttria content. 26
JUNE 26 MONDAY MORNING RIVA-TF-MoM-OR.6 A MINIMALIST SURFACE DECOMPOSITION METHOD AP- PLIED TO STUDY THE SURFACE CONTROL OF THE Au POLYCRYSTALLINE CO- LUMNAR FILM GROWTH. E. Rodríguez-Cañas *, and J. L. Sacedón. Instituto de Ciencia de Materiales de Madrid (CSIC), 28049 Cantoblanco, Madrid, Spain. J. A. Aznárez. Instituto de Física Aplicada (CSIC), Serrano 144, 28006 Madrid, Spain. A. I. Oliva. Cinvestav del IPN Unidad Mérida, Dpto. de Física Aplicada, AP 73- Cordemex 97310 Mérida, Yucatán, Mexico A method based in the minimalist decomposition of surface morphologies is proposed for the study of surface protrusion terminated growth fronts. The method is applied to the STM morphology images of Au films thermally evaporated on native SiOx/Si(100) for a wide range of Au thickness (60- 1800 nm). In this case the bulk film morphology corresponds to a columnar competitive growth, and the growth front is composed of assembled paraboloidal meridian zones. The application of the method allows the numerical synthesis of height distribution curves by the convolution of the statistical parameters of the minimalist components. A complete set of statistical parameters, mean values and fluctuations, and their scaling during the growth are obtained. The slope at the borders of paraboloidal meridian zones are maintained near constant during the growth and appears as the controlling growth parameter. In fact its high value and the slope distribution curves can be explained by an out of equilibrium growth, controlled by steering and interface phenomena at border of the terraces in addition of an effective Ehrlich-Schwoebel step-edge barrier. The scaling agrees with simulations in which similar selected slopes are considered. One of the minimalist parameters is the fluctuation of the columnar height at the film surface, allowing to establish its relation with the other surface roughness parameters 25
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