Wüest M. 51 Wykes M. 82 Yamaguchi M. 17 Ybarra G. 129 Yubero F ...

JUNE 27 TUESDAY MORNING
JS1-TuM-INV.5 TAILORING THE OPTICAL PROPERTIES OF THIN FILMS DE-
POSITED BY PLASMA CVD. A. Barranco, A. Borrás, F. Gracia, A.R. González-Elipe. Instituto
de Ciencia de Materiales de Sevilla (CSIC-Universidad de Sevilla), c/Américo Vespucio s/n 41092
Sevilla Spain.
Plasma Enhanced Chemical Vapour Deposition (PECVD) and plasma treatments are being increasingly
used for the fabrication of optical films and coatings. The technique offers a wide ranging control
of plasma surface interactions, high deposition rates and conformal depositions being fully compatible
with the existing silicon based semiconductor technology and scaleable from the laboratory to
the industry. These materials are obtained in the form of single thin films, multilayers, graded index
layers, nanocomposites, patterns, and others for applications such as optical filters, antireflective
coatings, optical waveguides, wavelength shifters, optical sensors, etc. For these applications is critical
the control of the chemical composition and the microstructure of the deposited films.
Novel methodologies for the synthesis of optical thin films using plasmas will be presented. The examples
cover the control of n and k values in organosilicon thin films, the use of sacrificial polymeric
layers to tailor the microstructure of oxide films deposited at room temperature and the microstructural
control of TiO x and MO x /TiOx optical films. Besides, a novel type of organic and nanocomposite
fluorescent films deposited from laser dyes will be discussed. These highly functionalized
thin films are the basis of a novel photonic materials technology (i.e., photonic filters and sensor on
a chip devices).
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