biographical summary of robert j. nemanich - Department of Physics ...

116. “Epitaxial Growth and Stability of C49 TiSi2 on Si (111),” H. Jeon, J.W. Honeycutt, C.A.
Sukow, T.P. Humphreys, R.J. Nemanich, and G.A. Rozgonyi, Epitaxial Heterstructures,
edited by D.W. Shaw, J.C. Bean, V.G. Keramidas, P.S. Peercy, (Mater. Res. Soc. Symp.
Proc., 198, San Fransisco, CA, p. 595-600 (1990).
117. “Heteroepitaxial CxSi1-x Metastable Alloys,” J.B. Posthill, R.A. Rudder, S.V. Hattangady,
G.G. Fountain, T.P. Humphreys, R.J. Nemanich, N.R. Parikh, and R.J. Markunas, Epitaxial
Heterostructures, edited by Don W. Shaw, John C. Bean, Vassilis G. Keramidas, and Paul
S. Peercy, (Mater. Res. Soc. Symp. Proc., 198, San Fransisco, CA, p. 497-502 (1990).
118. “Assesment of SixGe1-x Epitaxial Alloys Grown on Silicon at 350 degrees Celcius,” J.B.
Posthill, D.P. Malta, S.V. Hattangady, N.R. Parikh, T.P. Humphreys, R.A. Rudder, G.G.
Fountain, R.J. Nemanich, and R.J. Markunas. Proceedings of the XIIth International
Congress for Electron Microscopy, Eds. L.D. Peachy and D.B. Williams, 4:646, (1990).
119. “Photoluminescence Spectroscopy Measurement of Elastic Strain in Heteroepitaxial GaAs
Films,” T.P. Humphreys, R.J. Nemanich, K. Das, N.R. Parikh, and J.B. Posthill, Electronic
Letters 26, 835-837, (1990).
120. “Electrical Properties of B Doped CVD Grown Polycrystalline Diamond Films,” K.
Nishimura, K. Das, J.T. Glass, K. Kobashi and R.J. Nemanich in The Physics and
Chemistry of Carbides; Nitrides and Borides, 183-194, (1990).
121. “Titanium Silicide: Epitaxy, Morphology and Structure,” R.J. Nemanich, H. Jeon, J.W.
Honeycutt, C.A. Sukow, and G.A. Rozgonyi. MCNC Microelectronics Technical Bulletin,
2:6-9 (1990).
122. “Vapor deposition of diamond thin films on various substrates,” Y.H. Lee, K.J. Bachmann,
J.T. Glass, Y.M. LeGrice, and R.J. Nemanich. Appl. Phys. Lett. 57, 1916-1918, (1990).
123. “Process and Surface Characterization of Hydrogen Plasma Cleaning of Si(100),” T.P.
Schneider, J. Cho, J. van der Weide, S.E. Wells, G. Lucovsky, R.J. Nemanich, M.J.
Mantini, R.A. Rudder, and R.J. Markunas, Chemical Perspectives of Microelectric
Materials II, edited by I.V. Interrante, K.F. Jenson, L.H. Duboise, M.E. Gross, (Mater.
Res. Soc. Symp. Proc., 204, Boston, Massachusetts, p. 333 (1990).
1991
124. “Electronic Structure, Surface Morphology and Epitaxy of Remote H-Plasma Cleaned
Si(100),” T.P. Schneider, J. Cho, D.A. Aldrich, Y.L. Chen, D. Maher and R.J. Nemanich,
Proceedings of the Second International Symposium on Cleaning Technology in
Semiconductor Device Manufacturing of the Electrochemical Society, Eds. Jerzy Ruzyllo
and Richard E. Novak, Vol. 92-12, pp 123-127, (1991).
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