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biographical summary of robert j. nemanich - Department of Physics ...

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267. “Structure and stability <strong>of</strong> cobalt-silicon-germanium thin films,” Peter T. Goeller, Boyan I.<br />

Boyanov, Dale E. Sayers and Robert J. Nemanich. Nuclear Instruments and Methods in<br />

<strong>Physics</strong> Research B 133, 84-89 (1997).<br />

268. “Correlation <strong>of</strong> morphology and electrical properties <strong>of</strong> nanoscale TiSi2 epitaxial islands on<br />

Si (001),” Woochul Yang, F. J. Jedema, H. Ade, and R. J. Nemanich. Thin Solid Films<br />

308-309, 627-633 (1997).<br />

269. “Sublimation growth and characterization <strong>of</strong> bulk aluminum nitride single crystals,”<br />

Cengiz M. Balkas, Zlatko Sitar, Tsvetanaka Zheleva, L. Bergman, R. J. Nemanich and R.<br />

F. Davis. J. <strong>of</strong> Crystal Growth 179, 363-370 (1997).<br />

270. “Growth <strong>of</strong> III-Nitrides via Sublimation and Metalorganic Vapor Phase Epitaxy,” Robert F.<br />

Davis, B. L. Ward, Z. Sitar, T. Zheleva, L. Bergman, I. K. Shmagin, J. F. Muth, R. M.<br />

Kolbas, and R. J. Nemanich. Kovine, Zlitine, Technologije 31, (6), 485-494 (1997).<br />

1998<br />

271. “Electron Emission from Metal Diamond (100), (111) and (110) Interfaces,” P. K. Baumann<br />

and R. J. Nemanich, Diamond Rel. Mat. 7, (2-5), 612-619 (1998).<br />

272. “Electron affinity and Schottky barrier height <strong>of</strong> metal-diamond (100), (111), and (110)<br />

interfaces,” P. K. Baumann and R. J. Nemanich, J. <strong>of</strong> Appl. Phys. 83, (4), 2072-2082<br />

(1998).<br />

273. “Raman Analysis <strong>of</strong> AlxGa1-xN Films,” Leah Bergman, Mitra Dutta, Michael D. Bremser,<br />

Ok-Hyun Nam, William G. Perry, Dimitri Alexson, Robert F. Davis, Cengiz M. Balkas and<br />

Robert J. Nemanich. Nitride Semiconductors, edited by F. A. Ponce, S. P. DenBaars, B. K.<br />

Meyer, S. Nakamura and S. Strite. (Mater. Res. Soc. Symp. Proc., Vol. 482, Boston,<br />

Massachusetts) p. 543-548.<br />

274. “Morphology <strong>of</strong> Silicon Oxides on Silicon Carbide,” M. L. O’Brien, S. Pejdo and R. J.<br />

Nemanich, Power Semiconductor Materials and Devices, edited by S. J. Pearton, R. J.<br />

Shul, E. Wolfgang, F. Ren, and S. Tenconi. (Mater. Res. Soc. Symp. Proc., Vol. 483,<br />

Spring 1998, San Francisco, CA p. 437-442, (1998).<br />

275. “Electron Emission Properties <strong>of</strong> Si Field Emitter Arrays Coated with Nanocrystalline<br />

Diamond from Fullerene Precursors,” T. G. McCauley, T. D. Corrigan, A. R. Krauss, O.<br />

Auciello, D. Zhou, D. M. Gruen, D. Temple, R. P. H. Chang, S. English, and R. J.<br />

Nemanich. Covalently Bonded Disordered Thin-Film Materials, edited by M. P. Siegal, W.<br />

I. Milne, J. E. Jaskie (Mater. Res. Soc. Symp. Proc., Vol 498, 1997 Fall Meeting, Boston,<br />

MA. p. 227-232 (1998)<br />

276. “Electron Emission Properties <strong>of</strong> Diamond and III-V Nitrides,” R. J. Nemanich, P. K.<br />

Baumann, M. J. Benjamin, S. L. English, J. D. Hartman, A. T. Sowers, B. L. Ward and P.<br />

C. Yang. Mat. Issues in Vacuum Microelectronics, edited by W. Zhu, L. S. Pan, T. E.<br />

40

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