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biographical summary of robert j. nemanich - Department of Physics ...

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408. “Direct bonding <strong>of</strong> GaN and SiC; A novel technique for electronic device fabrication,” J.<br />

Lee, R.F. Davis, R.J. Nemanich, Int. J. High Speed Electron. Syst. 14, No.1, 83-105,<br />

(2004).<br />

409. “A novel approach for determining the effective tunneling mass <strong>of</strong> electrons in HfO2 and<br />

other high-K alternative gate dielectrics for advanced CMOS devices,” C. L. Hinkle, C.<br />

Fulton, R. J. Nemanich, G. Lucovsky. Microelectronic Engineering, 72, 1-4, 257-262,<br />

April 2004. (Proceedings <strong>of</strong> the 13th Biennial Conference on Insulating Films on<br />

Semiconductors. Barcelona, 18 - 20 June 2003)<br />

410. “Fibrinogen adsorption onto microwave plasma chemical vapor deposited diamond films,”<br />

G.J. Garguilo, B.A. Davis, M. Buddie, F.A.M. Kock, R.J. Nemanich, Diamond and Related<br />

Materials 13, (4-8): 595-599 (2004).<br />

411. “Direct correlation <strong>of</strong> surface morphology with electron emission sites for intrinsic<br />

nanocrystalline diamond films,” E.M. Kock, J.M. Garguilo, R.J. Nemanich, Diamond and<br />

Related Materials 13, (4-8), 1022-1025 (2004).<br />

412. “Experimental studies <strong>of</strong> the formation process and morphologies <strong>of</strong> carbon nanotubes with<br />

bamboo mode structures,” Y.Y.Wang, G.Y. Tang, F.M. Koeck, B. Brown, J.M. Garguilo,<br />

R.J. Nemanich, Diamond and Related Materials 13, (4-8), 1287-1291 (2004).<br />

413. “Polarization dependent electron affinity <strong>of</strong> LiNbO3 surfaces”, W.-C. Yang, B.J.<br />

Rodriguez, A. Gruverman, R.J. Nemanich. Appl Phys Lett 85, (12), 2316-2318 (2004).<br />

414. “Spectroscopic studies <strong>of</strong> metal high-k dielectrics: transition metal oxides and silicates, and<br />

complex rare earth/transition metal oxides”, G. Lucovsky, J. G. Hong, C. C. Fulton, Y.<br />

Zou, R. J. Nemanich, H. Ade, D. G. Scholm, J. L. Freeouf Phy Stat Sol B, 241 (10), 2221-<br />

2235 (2004).<br />

415. “Enhanced tunneling in stacked gate dielectrics with ultra-thin HfO2 layers sandwiched<br />

between thicker SiO2 layers”, C.L. Hinkle, C. Fulton, R.J. Nemanich and G. Lucovsky,<br />

Appl. Surf. Sci, 234, (1-4), 240-245 (2004).<br />

416. “X-ray absorption spectra fro transition metal high-kappa dielectrics: Final state<br />

differences for intra- and interatomic transitions,” G. Lucovsky, J.G. Hong, C.C. Fulton, Y.<br />

Zou, R.J. Nemanich, H. Ade. J. Vac. Sci. Technol. B 22, 4, 2132-2138 (2004).<br />

2005<br />

417. “Investigation <strong>of</strong> the mechanism <strong>of</strong> polarization switching in ferroelectric capacitors by<br />

three- dimensional piezoresponse force microscopy”, Rodriguez BJ, Gruverman A,<br />

Kingon AI, Nemanich RJ, Cross JS, Appl Phys A – Materials Science & Processing, 80, 1,<br />

99-103 (2005). Published on line, 9 July, 2004<br />

54

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