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190. “Structural Investigation <strong>of</strong> the Initial Interface Region Formed by Thin Zirconium Films<br />

on Silicon (111), A. M. Edwards, Y. Dao, K. M. Kemner, R. J. Nemanich and D. E. Sayers,<br />

J. Appl. Phys. 76, 4630-4635, (1994).<br />

191. “Angle-Resolved Photoemission <strong>of</strong> Diamond (111) and (100) Surfaces; Negative Electron<br />

Affinity and Band Structure Measurements,” J. van der Weide and R. J. Nemanich.<br />

Presented at the 21st Conference on the <strong>Physics</strong> and Chemistry <strong>of</strong> Semiconductor<br />

Interfaces - Mohonk, New York, January 24-28, 1994, J. Vac. Sci. Technol. B12, 2475-<br />

2479, (1994).<br />

192. “The Origin <strong>of</strong> the Broadband Luminescence and the Effect <strong>of</strong> Nitrogen Doping on the<br />

Optical Properties <strong>of</strong> Diamond Films,” L. Bergman, M. T. McClure, J. T. Glass and R. J.<br />

Nemanich. J. Appl. Phys. 76, 3020-3027 (1994).<br />

193. “Observation <strong>of</strong> a Negative Electron Affinity for Heteroeptaxial AlN on (6H)-<br />

SiC(0001),” M. C. Benjamin, C. Wang, R. F. Davis, and R. J. Nemanich, Appl. Phys. Lett.<br />

64, 3288-3290 (1994).<br />

194. “Hydrogen Plasma Cleaning Prior to Low Temperature Gate Oxide Deposition in Cluster<br />

Fabricated Mosfets,” J. S. Montgomery, J. P. Barnak, A. Bayoumi, J. R. Hauser, and R. J.<br />

Nemanich, in Cleaning Technology in Semiconductor Device Manufacturing, edited by J.<br />

Ruzyllo and R. E. Novak, ECS Proceedings Vol. PV 94-7, (Electrochemical Soc.,<br />

Pennington, NJ) p. 296-306, (1994).<br />

195. “Reduction <strong>of</strong> Surface Roughening and Subsurface Defects in H-Plasma Cleaning <strong>of</strong><br />

Si(100),” T. P. Schneider, J. S. Montgomery, H. Ying, J. P. Barnak, Y. L. Chen, D. M.<br />

Maher and R. J. Nemanich, Cleaning Technology in Semiconductor Device Manufacturing,<br />

edited by J. Ruzyllo and R. E. Novak, ECS Proceedings, Vol. PV 94-7, Pennington, NJ, 00.<br />

329-338, (1994).<br />

196. “Properties <strong>of</strong> the Heteroepitaxial AlN/SiC Interface” M. C. Benjamin, C. Wang, R. S.<br />

Kern, R. F. Davis, and R. J. Nemanich, Diamond, SiC and Nitride Wide Bandgap<br />

Semiconductors, edited by Calvin H. Carter, Jr., Gennady Gildenblat, Shuji Nakamura and<br />

Robert J. Nemanich (Mater. Res. Soc. Symp. Proc., 339, San Francisco, CA p. 81-88<br />

(1994).<br />

197. “Comparison <strong>of</strong> Surface Cleaning Processes for Diamond C(001),” Peter K. Baumann, T.P.<br />

Humphreys, and R.J. Nemanich, Diamond SiC Nitride Wide Bandgap Semiconductors,<br />

edited by Calvin H. Carter, Jr., Gennady Gildenblat, Shuji Nakamura and Robert J.<br />

Nemanich (Mater. Res. Soc. Symp. Proc. 339, San Fransisco, CA, p. 69-74 (1994).<br />

198. “Strain and Impurity Content <strong>of</strong> Synthetic Diamond Crystals,” T. L. McCormick, W. E.<br />

Jackson, and R. J. Nemanich, Novel Forms <strong>of</strong> Carbon II, edited by C.L. Renschler, D.M.<br />

Cox, J.J. Pouch, Y. Achiba (Mater. Res. Soc. Proc. Symp. 349, San Fransisco, CA, p. 445-<br />

450 (1994).<br />

32

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