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edited by F. Ponce, T. Moustakas, I. Akasaki, B. Monemar (Mater. Res. Soc. Symp. Proc.<br />

449, Boston, MA, Fall 1996) p. 725-730.<br />

247. “Nitride Based Thin Film Cold Cathode Emitters,” James A. Christman, Andrew T.<br />

Sowers, Michael D. Bremser, Brandon L. Ward, Robert F. Davis and Robert J. Nemanich.<br />

III-V Nitrides edited by F. Ponce, T. Moustakas, I. Akasaki, B. Monemar (Mater. Res. Soc.<br />

Symp. Proc. 449, Boston, MA, Fall 1996) p. 1121-1126.<br />

248. “Growth <strong>of</strong> Bulk ALN and GaN Single Crystals by Sublimation,” C. M. Balkas Z. Sitar T.<br />

Zheleva, L. Bergman, I. K. Shmagin, J. F. Muth, R. Kolbas, R. Nemanich, and R. F. Davis.<br />

III-V Nitrides edited by F. Ponce, T. Moustakas, I. Akasaki, B. Monemar (Mater. Res.<br />

Soc. Symp. Proc. 449, Boston, MA, Fall p. 41-46 (1996).<br />

249. “Selective Growth <strong>of</strong> GaN and Al0.2Ga0.8N on GaN/AlN/6H-SiC(0001) Multilayer<br />

Substrates Via Organometallic Vapor Phase Epitaxy,” O.H. Nam, M.D. Bremser, B.L.<br />

Ward, R.J. Nemanich, R.F. Davis, III-V Nitrides edited by F. Ponce, T. Moustakas, I.<br />

Akasaki, B. Monemar, (Mater. Res. Soc. Symp. Proc., Vol. 449, Boston, MA, Fall 1996)<br />

p. 107-112, and Jpn.Journal <strong>of</strong> Appl. Phys., Vol. 36, No. 5A, p L532-L535 (1997).<br />

250. “Large Crystallite Polysilicon Deposited Using Pulsed-Gas PECVD at Tempatures Less<br />

than 250°C,” E. Srinivasan, S. J. Ellis R. J. Nemanich and G. N. Parsons. (Mater. Res. Soc.<br />

Symp Proc., Vol 452, Advances in Microcrystalline and Nanocrystalline Semiconductors,<br />

p. 989-994 (1996).<br />

251. “Hydrogen Evolution from Strained SixGe1-x(100)2x1:H Surfaces,” Ja-Hum Ku and R.J.<br />

Nemanich. J. <strong>of</strong> Appl. Phys. 80, (8), 4715-4721 (1996).<br />

252. “Cleaning <strong>of</strong> GaN Surfaces,” L.L. Smith, S.W. King, R.J. Nemanich, R.F. Davis. J.<br />

Electronic Mater. 25, (5), 805-810 (1996).<br />

253. “Removal <strong>of</strong> Fluorine and CFx Residue from Si (100) Surfaces by Remote RF Hydrogen<br />

Plasma,” J. P. Barnak, H. Ying, S. King and R. J. Nemanich. Proceedings <strong>of</strong> the Third<br />

International Symposium <strong>of</strong> Ultra Clean Processing <strong>of</strong> Silicon Surfaces, p. 251-255,<br />

Antwerp, Belgium (1996).<br />

254. “Surface electronic Structure <strong>of</strong> Clean and Hydrogen Chemisorbed SixGe1-x Alloy<br />

Surfaces,” Ja-Hum Ku and R.J. Nemanich, Physical Review B54, 14102-14110 (1996).<br />

255. “Phase Transformations during Microcutting Tests on Silicon,” B. V. Tanikella, A. H.<br />

Somashekhar, A. T. Sowers, R. J. Nemanich and R. O. Scattergood, Appl. Phys. Lett. 69<br />

(19), 2870-2872 (1996).<br />

1997<br />

38

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