biographical summary of robert j. nemanich - Department of Physics ...

229. “Silicide Formation and Stability of TiSiGe and Co/SiGe,” Zhihai Wang, D.B. Aldrich,
Y.L. Chen, D.E. Sayers, and R.J. Nemanich. Thin Solid Films 270, 555-560 (1995). (Also
in the proceedings for the ICMCTF Conference in San Diego, CA, April (1995.)
230. “Phase stabilities and surface morphologies of (Ti1-xZrx)Si2 thin films on Si(100),” Y. Dao,
D.E. Sayers and R.J. Nemanich. J. Appl. Phys. 78, (11), 6584-6591 (1995).
231 “(Negative) Electron Affinity of AlN and AlGaN Alloys,” R.J. Nemanich, M.C. Benjamin,
S.W. King, M.D. Bremser, R.F. Davis, B. Chen, Z. Zhang, and J. Bernholc. Gallium
Nitride and Related Materials, edited by F. A. Ponce, R. D. Dupuis, S. Nakamura and J. A.
Edmond. (Mater. Resl Soc. Symp. Proc. 395, Boston, MA, Fall pp 777-788 (1995).
232. “XPS Measurement of the SiC/AlN Band-Offset at the (0001) Interface,” Sean King, M.C.
Benjamin, R.J. Nemanich, R.F. Davis, and W.R.L. Lambrecht. Gallium Nitride and
Related Materials, edited by F. A. Ponce, R. D. Dupuis, S. Nakamura and J. A. Edmond.
(Mater. Res. Soc. Proc. 395, Boston, MA, Fall pp 375-380 (1995).
233. “Ex situ and In situ Methods for Oxide and Carbon Removal from AlN and GaN
Surfaces,” Sean W. King, Laura L. Smith, J.P. Barnak, Ja-Hum Ku, Jim A. Christman,
Mark C. Benjamin, R.J. Nemanich and Robert F. Davis. Gallium Nitride and Related
Materials, edited by F. A. Ponce, R. D. Dupuis, S. Nakamura and J. A. Edmond (Mater.
Res. Soc. Symp. Proc. 395, Boston, MA, Fall, pp. 739-744 (1995).
234. “Characterization of Zirconium Germanosiliciide formed by Solid State Reaction of Zr
with Si1-xGex Alloys,” Z. Wang, D.B. Aldrich, P. Goeller, R.J. Nemanich and D.E. Sayers.
Silicide Thin Films-Fabrication, Properties, and Applications, edited by Raymond T.
Tung, Karen Maex, Paul W. Pellegrini, and Leslie H. Allen. (Mater. Res. Soc. Symp. Proc.
402, Boston, MA p. 387-392 (1996).
235. “Epitaxial Films of Cobalt Disilicide (100) Evaporated onto Si(100) from a Mixed Source,”
P.T. Goeller, Z. Wang, D.E. Sayers, J.T. Glass and R.J. Nemanich. Silicide Thin Films-
Fabrication, Properties, and Applicatioins, edited by Raymond T. Tung, Karen Maex, Paul
W. Pellegrini and Leslie H. Allen, (Mater. Res Soc. Proc. Symp. 402, Boston, MA, Fall
pp. 511-516 (1995).
236. “Interface Stability of Ti(Si1-yGey)2 and Si1-xGex Alloys,” D.B. Aldrich, F.M. D'Huerle,
D.E. Sayers and R.J. Nemanich. Silicide Thin Films-Fabrication, Properties, and
Applicatioins, edited by Raymond T. Tung, Karen Maex, Paul W. Pellegrini and Leslie H.
Allen, (Mater. Res Soc. Proc. Symp. 402, Boston, MA, Fall pp. 21-26 (1995).
237. “Titanium Germanosilicide Phase Formation During the Ti-Si1-xGex Solid Phase
Reactions,” D.B. Aldrich, D.E. Sayers and R.J. Nemanich, Silicide Thin Films-Fabrication,
Properties, and Applicatioins, edited by Raymond T. Tung, Karen Maex, Paul W.
Pellegrini and Leslie H. Allen, (Mater. Res Soc. Proc. Symp. 402, Boston, MA, Fall pp.
405-410 (1995).
36