biographical summary of robert j. nemanich - Department of Physics ...
biographical summary of robert j. nemanich - Department of Physics ...
biographical summary of robert j. nemanich - Department of Physics ...
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A. Atwater, Eric Chason, Marcia H. Grabow. (Mater. Res. Soc. Symp. Proc. 280, Boston,<br />
Massachusetts, p. 585-588 (1993).<br />
172. “Surface and Interface Morphology <strong>of</strong> Small Islands <strong>of</strong> Titanium and Zirconium Silicides<br />
on Silicon,” B. L. Kropman, C. A. Sukow and R. J. Nemanich, Evolution <strong>of</strong> Surface and<br />
Thin Film Microstructure, edited by Harry A. Atwater, Eric Chason, Marcia H. Grabow.<br />
(Mater. Res. Soc.Symp. Proc. 280, Boston, Massachusetts, 589-592 (1993).<br />
173. “Influence <strong>of</strong> Dry and Wet Cleaning on the Properties <strong>of</strong> Rapid Thermal Grown and<br />
Depostied Gate Dielectrics,” Xiaoli Xu, Richard T. Kuehn, Mehmet C.Öztürk, and Jimmie<br />
J. Wortman, Robert J. Nemanich, Gari S. Harris and Dennis M. Maher, Journal <strong>of</strong><br />
Electronic Materials 22, (3), 335-339, (1993).<br />
174. “Plasma Surface Interactions and Surface Properties for Remote H-Plasma Cleaning <strong>of</strong><br />
Si(100), T. P. Schneider, J. Cho, Y. L. Chen, D. M. Maher and R. J. Nemanich, Surface<br />
Chemical Cleaning and Passivation for Semiconductor Processing, edited by G. S.<br />
Higashi, E. A. Irene, T. Ohmi (Mater. Res. Soc. Symp. Proc. 315, San Francisco, CA, p.<br />
197-209 (1993).<br />
175. “A Study <strong>of</strong> Surface and Subsurface Properties <strong>of</strong> Si(100) After Hydrogen Ion-Beam<br />
Exposure,” H. Liu, T. Schneider, Y. L. Chen , A. Buczkokwski, D. Korzec, J. Engeman, D.<br />
M. Maher and R. J. Nemanich, Surface Chemical Cleaning and Passivation for<br />
Semiconductor Processing, edited by G. S. Higashi, E. A. Irene, T. Ohmi (Mater. Res. Soc.<br />
Symp. Proc. 315, San Francisco, CA, p. 231-236 (1993).<br />
176. “Phase Transition and Formation <strong>of</strong> TiSi2 Codeposited on Atomically Clean Si(111),”<br />
Hyeongtag Jeon, Y. S. Cho, E. Y. Kang, J. W. Park, and R. J. Nemanich, Phase<br />
Transformations in thin Films: Thermodynamics and Kinetics. edited by M. Atzmon, A. L.<br />
Greer, J. M. E. Harper, M. R. Libera, (Mater. Res. Soc. Symp. Proc 311, p. 275 (1993).<br />
177. “Effect <strong>of</strong> surface hydrogen on metal-diamond interfaces properties,” T. Tachibana, J. T.<br />
Glass, and R. J. Nemanich, J. Appl. Phys. 73, 835-842, (1993).<br />
178. “Photophoretic Deflection <strong>of</strong> Particles in Subatmospheric Pressure Chambers,” Ravindran<br />
Periasamy, Julian Selvaraj, Robert P. Donovan and Robert J. Nemanich (extended<br />
abstract).TECHCON '93, Atlanta, GA, September 28-30, 1993.<br />
179. “Effects <strong>of</strong> Hydrogen Plasma Cleaning Prior to Low Temperature Gate Oxide Deposition,”<br />
J S. Montgomery, R. J. Nemanich, J. Barnak, A. Bayoumi, C. Silvestre, and J. R. Hauser,<br />
(poster). TECHCON '93, Atlanta, GA, September 28-30, 1993.<br />
180. “Heteroepitaxial Nucleation and Growth <strong>of</strong> Highly Oriented Diamond Films on Silicon Via<br />
In-Situ Carburization and Bias-Enhanced Nucleation,” Brian R. Stoner, Scott R. Sahaida,<br />
Dean M. Malta, Andy Sowers, and Robert J. Nemanich, 2nd International Conference on<br />
the Applications <strong>of</strong> Diamond Films and Related Materials, Editors: M. Murakawa, Y.<br />
Tzeng and W. A. Yarborough, Tokyo, Japan, pp. 825-830 (1993).<br />
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