Practice of Kinetics (Comprehensive Chemical Kinetics, Volume 1)

448 INDEXTtailing reducer, in gas chromatography, 80, 81tangent method, for determination of reactionorder, 356, 357, 359tantalum, chemical transport of as iodide, 248—, chemisorption on, 190—, cleaning surface of, 182—* preparation of film of, 183Teflon, coated piston, in circulating pump, 232—, coating of, for reference electrode in vibratingcondenser method, 207—, in Langmuir trough method, 267—, in pressure transducer, 14—, in vacuum taps, 7TeH radical, ESR study of, 313tellurium, clean surface by cleavage, 184—, mirrors of, reaction with radicals, 315temperature, control of, 8-10—, change of and pressure in reactions, 98—, change, very small, measurement of, 99,100, 103—, effect on diffusion coefficient, 225—, effect on fluorescence spectrum of aminopyrenes,156—, effect on intensity of Hg lamp, 41, 44—, effect on NMR lines, 147-149—, in flames, definition of, 169—, —, measurement of, 170, 171—, low, production of, 31-34—, of point source lamp, 46— t ofreaction, attainment of and error in ratecoefficient, 369—, stationary concentration of CH 3 , effect on,5—, study of effect on rate, 403-406temperature jump, for fast reactions, 133-136—, —, and flow system, 165temperature rise, and differential calorimetry,11, 100, 101—, in flash photolysis, 120—, in reaction vessels, 12—, in shock wave, 125-127termination, in chain reactions, 3, 11—, in H 2 +O a reaction, 17, 18thallium, mirror of, radical removal by, 315—, preparation of films of, 183thermal analysis, see differential thermal analysisthermal conductivity, and determination ofeffective diffusivity, 226, 227—, and differential calorimetry, 100 '.••;•—, and explosion, 18—, and thermal gradients in vessels, 11, 12*—, for determination of atoms, 324, 325—, for determination of o and p H a , 236, 316—, of gases and gas chromatography, 82—, to follow reactions, 97—, use in adsorption studies, 188thermal gradients, and mixing of gases, 20—, in reaction mixture, II, 12, 30, 75thermionic emission, to follow adsorption, 200,201thermocouples, 9-11, 32, 33, 46—, use of in differential thermal analysis, 257—, use of in semiconductivity determination,214—, use of to determine atom concentrations,326—, use of with flames, 170thermograms, for solid reactions, 257-259thermomolecular flow, and beam microbalances,198thermopiles, 59, 60—, use in photoelectric emission studies, 201thermostats, 8—, and dilatometry, 23—, and gas chromatography, 85—, and microbalances, 198—, for Langmuir trough, 266Thiele diffusion modulus, 228thorium 228, in study of metal oxidation, 246threshold frequency, for photoelectric emission,201time, random errors in, 371—, reduced, see reduced timetime intervals, and treatment of first orderreactions, 389, 391time-of-flight mass spectrometer, see massspectrometertin, chemisorption on, 190—, mirror of, radical removal by, 315tin oxide, coating of in field emission microscope,203—, coating of in static condenser method, 205titanium, chemisorption on, 190—, preparation of films of, 183titanium dioxide, as catalyst support, 222—, as metal support for IR studies of adsorption,217titration, gas phase, 2, 78, 320, 321—, —, to calibrate ESR, 313—, —, to calibrate mass spectrometer, 30T-jump, see temperatureToepler pump, 31, 32toluene, as radical trap, 74, 316—, bromination of, steady state in, 4•- toluene carrier technique, 24, 26, 30topatron mass analyser, 242, 243torsion viscometer, 270transducer, see also pressure transducer