PCT/2001/21 : PCT Gazette, Weekly Issue No. 21, 2001 - WIPO
PCT/2001/21 : PCT Gazette, Weekly Issue No. 21, 2001 - WIPO
PCT/2001/21 : PCT Gazette, Weekly Issue No. 21, 2001 - WIPO
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<strong>21</strong>/<strong>2001</strong><br />
25 May/mai <strong>2001</strong> <strong>PCT</strong> <strong>Gazette</strong> - Section I - <strong>Gazette</strong> du <strong>PCT</strong> 8823<br />
Wilmington, DE 19803 (US). ZUMSTEG,<br />
Fredrick, Claus, Jr. [US/US]; 2715 Silverside<br />
Road, Wilmington, DE 19810 (US).<br />
(74) SIEGELL, Barbara, C.; E. I. Du Pont de<br />
Nemours and Company, Legal Patent Records<br />
Center, 1007 Market Street, Wilmington, DE<br />
19898 (US).<br />
(81) CN JP KR US.<br />
(84) EP (AT BE CH CY DE DK ES FI FR GB GR<br />
IE IT LU MC NL PT SE TR).<br />
Published / Publiée :(c)<br />
(51) 7 G03F 7/00, B81C 1/00, H01F 41/04<br />
(11) WO 01/37045 (13) A1<br />
(<strong>21</strong>) <strong>PCT</strong>/EP00/11447<br />
(22) 17 <strong>No</strong>v/nov 2000 (17.11.2000)<br />
(25) de (26) de<br />
(30) 199 55 975.9 19 <strong>No</strong>v/nov 1999 DE<br />
(19.11.1999)<br />
(43) 25 May/mai <strong>2001</strong> (25.05.<strong>2001</strong>)<br />
(54) FLAT COIL AND LITHOGRAPHIC<br />
METHOD FOR PRODUCING MICRO-<br />
COMPONENTS<br />
BOBINE PLATE ET PROCEDE LITHO-<br />
GRAPHIQUE POUR PRODUIRE DES<br />
MICROCOMPOSANTS<br />
(71) INSTITUT FÜR MIKROTECHNIK<br />
MAINZ GMBH [DE/DE]; Carl-Zeiss-<br />
Strasse 18-20, 55129 Mainz (DE).<br />
(for all designated States except / pour tous<br />
les États désignés sauf US)<br />
(72, 75) SCHMITZ, Felix [DE/DE]; Gartenfeldplatz<br />
8, 55118 Mainz (DE). NIENHAUS,<br />
Matthias [DE/DE]; St.-Sebastian-Strasse 6,<br />
55128 Mainz (DE). LACHER, Manfred<br />
[DE/DE]; Kästrich 53, 55116 Mainz (DE).<br />
(74) FUCHS, Jürgen, H. et al. / etc.; Abraham-<br />
Lincoln-Strasse 7, 65189 Wiesbaden (DE).<br />
(81) AE AG AL AM AT AU AZ BA BB BG BR<br />
BY BZ CA CH CN CR CU CZ DK DM DZ<br />
EE ES FI GB GD GE GH GM HR HU ID IL<br />
IN IS JP KE KG KP KR KZ LC LK LR LS<br />
LT LU LV MA MD MG MK MN MW MX<br />
MZ NO NZ PL PT RO RU SD SE SG SI SK<br />
SL TJ TM TR TT TZ UA UG US UZ VN YU<br />
ZA ZW.<br />
(84) AP (GH GM KE LS MW MZ SD SL SZ TZ<br />
UG ZW); EA (AM AZ BY KG KZ MD RU<br />
TJ TM); EP (AT BE CH CY DE DK ES FI<br />
FR GB GR IE IT LU MC NL PT SE TR); OA<br />
(BF BJ CF CG CI CM GA GN GW ML MR<br />
NE SN TD TG).<br />
Published / Publiée :(c)<br />
(51) 7 G03F 7/00, H01L <strong>21</strong>/312<br />
(11) WO 01/37046<br />
(<strong>21</strong>) <strong>PCT</strong>/RU00/00462<br />
(13) A1<br />
(22) 13 <strong>No</strong>v/nov 2000 (13.11.2000)<br />
(25) ru (26) ru<br />
(30) 99 123936 15 <strong>No</strong>v/nov 1999<br />
(15.11.1999)<br />
RU<br />
(30) 99 123937 15 <strong>No</strong>v/nov 1999<br />
(15.11.1999)<br />
RU<br />
(43) 25 May/mai <strong>2001</strong> (25.05.<strong>2001</strong>)<br />
(54) METHOD FOR FORMING A RELIEF<br />
ON THE SURFACE OF A FUNCTIONAL<br />
LAYER<br />
PROCEDE DE FORMATION D’UN RE-<br />
LIEF A LA SURFACE D’UNE COUCHE<br />
FONCTIONNELLE<br />
(71, 72) RAKHOVSKY, Vadim Izrailovich<br />
[RU/RU]; B.Konjushkovsky per., 27a-17,<br />
Moscow, 123242 (RU).<br />
(74) OBSCHESTVO S OGRANICHENNOI<br />
OTVETSTVENNOSTIJU "ANTEKH";<br />
Kazarmenny per.,<br />
(RU).<br />
(81) CA DE JP US.<br />
6-1, Moscow, 109028<br />
(84) EP (AT BE CH CY DE DK ES FI FR GB GR<br />
IE IT LU MC NL PT SE TR).<br />
(51) 7 G03F 7/004<br />
(11) WO 01/37047 (13) A2<br />
(<strong>21</strong>) <strong>PCT</strong>/US00/31136<br />
(22) 14 <strong>No</strong>v/nov 2000 (14.11.2000)<br />
(25) en (26) en<br />
(30) 60/166,035 17 <strong>No</strong>v/nov 1999 US<br />
(17.11.1999)<br />
(43) 25 May/mai <strong>2001</strong> (25.05.<strong>2001</strong>)<br />
(54) NITRILE/FLUOROALCOHOL-CON-<br />
TAINING PHOTORESISTS AND AS-<br />
SOCIATED PROCESSES FOR MI-<br />
CROLITHOGRAPHY<br />
PHOTORESISTS A BASE DE NI-<br />
TRILE/FLUOROALCOOL ET PRO-<br />
CEDES DE MICROLITHOGRAPHIE<br />
ASSOCIES<br />
(71) E.I. DU PONT DE NEMOURS AND<br />
COMPANY [US/US]; 1007 Market Street,<br />
Wilmington, DE 19898 (US).<br />
(for all designated States except / pour tous<br />
les États désignés sauf US)<br />
(72, 75) FRYD, Michael [US/US]; 50 East<br />
Maple Avenue, Moorestown, NJ 08057 (US).<br />
SCHADT, Frank, Leonard, III [US/US];<br />
2407 Delaware Avenue, Wilmington, DE<br />
19806 (US). PERIYASAMY, Mookkan<br />
[US/US]; 2623 Pennington Drive, Wilmington,<br />
DE 19806 (US).<br />
(74) SINNOTT, Jessica, M.; E.I. Du Pont de<br />
Nemours and Company, Legal Patent Records<br />
Center, 1007 Market Street, Wilmington, DE<br />
19898 (US).<br />
(81) AE AG AL AM AT AU AZ BA BB BG BR<br />
BY BZ CA CH CN CR CU CZ DE DK DM<br />
DZ EE ES FI GB GD GE GH GM HR HU<br />
ID IL IN IS JP KE KG KP KR KZ LC LK<br />
LR LS LT LU LV MA MD MG MK MN MW<br />
MX MZ NO NZ PL PT RO RU SD SE SG SI<br />
SK SL TJ TM TR TT TZ UA UG US UZ VN<br />
YU ZA ZW.<br />
(84) AP (GH GM KE LS MW MZ SD SL SZ TZ<br />
UG ZW); EA (AM AZ BY KG KZ MD RU<br />
TJ TM); EP (AT BE CH CY DE DK ES FI<br />
FR GB GR IE IT LU MC NL PT SE TR); OA<br />
(BF BJ CF CG CI CM GA GN GW ML MR<br />
NE SN TD TG).<br />
(51) 7 G03F 7/027, 7/035, C08G 18/80<br />
(11) WO 01/37048 (13) A1<br />
(<strong>21</strong>) <strong>PCT</strong>/JP00/08026<br />
(22) 14 <strong>No</strong>v/nov 2000 (14.11.2000)<br />
(25) ja (26) ja<br />
(30) 11/325298 16 <strong>No</strong>v/nov 1999<br />
(16.11.1999)<br />
(43) 25 May/mai <strong>2001</strong> (25.05.<strong>2001</strong>)<br />
JP<br />
(54) PHOTOSENSITIVE COMPOSITION<br />
AND PRODUCTS OF CURING<br />
THEREOF<br />
COMPOSITION PHOTOSENSIBLE ET<br />
PRODUITS POUR LA DURCIR<br />
(71) MITSUBISHI CHEMICAL CORPORA-<br />
TION [JP/JP]; 5-2, Marunouchi 2-chome,<br />
Chiyoda-ku, Tokyo 100-0005 (JP).<br />
(for all designated States except / pour tous<br />
les États désignés sauf US)<br />
(72, 75) KUSAKA, Hisashi [JP/JP]; c/o Mitsubishi<br />
Chemical Corporation Yokkaichi<br />
Plant, 1, Toho-cho, Yokkaichi-shi, Mie<br />
510-0848 (JP). HATA, Kazuyuki [JP/JP];<br />
c/o Mitsubishi Chemical Corporation<br />
Yokkaichi Plant, 1, Toho-cho, Yokkaichi-shi,<br />
Mie 510-0848 (JP). SOEJIMA, Yuuji<br />
[JP/JP]; c/o Mitsubishi Chemical Corporation,<br />
Yokohama Research Center, 1000,<br />
Kamoshida-cho, Aoba-ku, Yokohama-shi,<br />
Kanagawa 227-0033 (JP).<br />
(74) OGURI, Shohei et al. / etc.; Eikoh Patent<br />
Office, Ark Mori Building, 28th Floor,<br />
12-32, Akasaka 1-chome, Minato-ku, Tokyo<br />
107-6028 (JP).<br />
(81) CN KR SG US.<br />
(84) EP (AT BE CH CY DE DK ES FI FR GB GR<br />
IE IT LU MC NL PT SE TR).<br />
(51) 7 G03F 7/075, C08L 83/07, C08G 77/20,<br />
G02B 6/12, C08J 7/18, G02B 5/18, 1/04<br />
(11) WO 01/37049 (13) A1<br />
(<strong>21</strong>) <strong>PCT</strong>/JP00/07949<br />
(22) 10 <strong>No</strong>v/nov 2000 (10.11.2000)<br />
(25) ja (26) ja<br />
(30) 11/323005 12 <strong>No</strong>v/nov 1999 JP<br />
(12.11.1999)<br />
(43) 25 May/mai <strong>2001</strong> (25.05.<strong>2001</strong>)<br />
(54) PHOTOSENSITIVE COMPOSITION,<br />
AND OPTICAL WAVEGUIDE ELE-<br />
MENT AND PROCESS FOR PRODUC-<br />
ING THE SAME<br />
COMPOSITION PHOTOSENSIBLE,<br />
ELEMENT A GUIDE D’ONDE OP-<br />
TIQUE ET PROCEDE DE PRODUC-<br />
TION DUDIT ELEMENT<br />
(71) NIPPON SHEET GLASS CO., LTD.<br />
[JP/JP]; 5-11, Doshomachi 3-chome,<br />
Chuo-ku, Osaka-shi, Osaka 541-0045 (JP).<br />
(for all designated States except / pour tous<br />
les États désignés sauf US)<br />
(72, 75) NAKAMURA, Koichiro [JP/JP]; Nippon<br />
Sheet Glass Co., Ltd., 5-11, Doshomachi<br />
3-chome, Chuo-ku, Osaka-shi, Osaka<br />
541-0045 (JP).<br />
(74) OHSHIMA, Masataka; Ohshima Patent Office,<br />
Fukuya Building, 3, Yotsuya 4-chome,<br />
Shinjuku-ku, Tokyo 160-0004 (JP).<br />
(81) CA CN JP US.<br />
(84) EP (AT BE CH CY DE DK ES FI FR GB GR<br />
IE IT LU MC NL PT SE TR).<br />
(51) 7 G03F 7/11, 7/038, H01L <strong>21</strong>/768<br />
(11) WO 01/37050 (13) A1<br />
(<strong>21</strong>) <strong>PCT</strong>/EP00/11448<br />
(22) 17 <strong>No</strong>v/nov 2000 (17.11.2000)<br />
(25) de (26) de<br />
(30) 199 55 969.4 19 <strong>No</strong>v/nov 1999<br />
(19.11.1999)<br />
DE