21.12.2012 Views

PCT/2001/21 : PCT Gazette, Weekly Issue No. 21, 2001 - WIPO

PCT/2001/21 : PCT Gazette, Weekly Issue No. 21, 2001 - WIPO

PCT/2001/21 : PCT Gazette, Weekly Issue No. 21, 2001 - WIPO

SHOW MORE
SHOW LESS

Create successful ePaper yourself

Turn your PDF publications into a flip-book with our unique Google optimized e-Paper software.

<strong>21</strong>/<strong>2001</strong><br />

25 May/mai <strong>2001</strong> <strong>PCT</strong> <strong>Gazette</strong> - Section I - <strong>Gazette</strong> du <strong>PCT</strong> 8823<br />

Wilmington, DE 19803 (US). ZUMSTEG,<br />

Fredrick, Claus, Jr. [US/US]; 2715 Silverside<br />

Road, Wilmington, DE 19810 (US).<br />

(74) SIEGELL, Barbara, C.; E. I. Du Pont de<br />

Nemours and Company, Legal Patent Records<br />

Center, 1007 Market Street, Wilmington, DE<br />

19898 (US).<br />

(81) CN JP KR US.<br />

(84) EP (AT BE CH CY DE DK ES FI FR GB GR<br />

IE IT LU MC NL PT SE TR).<br />

Published / Publiée :(c)<br />

(51) 7 G03F 7/00, B81C 1/00, H01F 41/04<br />

(11) WO 01/37045 (13) A1<br />

(<strong>21</strong>) <strong>PCT</strong>/EP00/11447<br />

(22) 17 <strong>No</strong>v/nov 2000 (17.11.2000)<br />

(25) de (26) de<br />

(30) 199 55 975.9 19 <strong>No</strong>v/nov 1999 DE<br />

(19.11.1999)<br />

(43) 25 May/mai <strong>2001</strong> (25.05.<strong>2001</strong>)<br />

(54) FLAT COIL AND LITHOGRAPHIC<br />

METHOD FOR PRODUCING MICRO-<br />

COMPONENTS<br />

BOBINE PLATE ET PROCEDE LITHO-<br />

GRAPHIQUE POUR PRODUIRE DES<br />

MICROCOMPOSANTS<br />

(71) INSTITUT FÜR MIKROTECHNIK<br />

MAINZ GMBH [DE/DE]; Carl-Zeiss-<br />

Strasse 18-20, 55129 Mainz (DE).<br />

(for all designated States except / pour tous<br />

les États désignés sauf US)<br />

(72, 75) SCHMITZ, Felix [DE/DE]; Gartenfeldplatz<br />

8, 55118 Mainz (DE). NIENHAUS,<br />

Matthias [DE/DE]; St.-Sebastian-Strasse 6,<br />

55128 Mainz (DE). LACHER, Manfred<br />

[DE/DE]; Kästrich 53, 55116 Mainz (DE).<br />

(74) FUCHS, Jürgen, H. et al. / etc.; Abraham-<br />

Lincoln-Strasse 7, 65189 Wiesbaden (DE).<br />

(81) AE AG AL AM AT AU AZ BA BB BG BR<br />

BY BZ CA CH CN CR CU CZ DK DM DZ<br />

EE ES FI GB GD GE GH GM HR HU ID IL<br />

IN IS JP KE KG KP KR KZ LC LK LR LS<br />

LT LU LV MA MD MG MK MN MW MX<br />

MZ NO NZ PL PT RO RU SD SE SG SI SK<br />

SL TJ TM TR TT TZ UA UG US UZ VN YU<br />

ZA ZW.<br />

(84) AP (GH GM KE LS MW MZ SD SL SZ TZ<br />

UG ZW); EA (AM AZ BY KG KZ MD RU<br />

TJ TM); EP (AT BE CH CY DE DK ES FI<br />

FR GB GR IE IT LU MC NL PT SE TR); OA<br />

(BF BJ CF CG CI CM GA GN GW ML MR<br />

NE SN TD TG).<br />

Published / Publiée :(c)<br />

(51) 7 G03F 7/00, H01L <strong>21</strong>/312<br />

(11) WO 01/37046<br />

(<strong>21</strong>) <strong>PCT</strong>/RU00/00462<br />

(13) A1<br />

(22) 13 <strong>No</strong>v/nov 2000 (13.11.2000)<br />

(25) ru (26) ru<br />

(30) 99 123936 15 <strong>No</strong>v/nov 1999<br />

(15.11.1999)<br />

RU<br />

(30) 99 123937 15 <strong>No</strong>v/nov 1999<br />

(15.11.1999)<br />

RU<br />

(43) 25 May/mai <strong>2001</strong> (25.05.<strong>2001</strong>)<br />

(54) METHOD FOR FORMING A RELIEF<br />

ON THE SURFACE OF A FUNCTIONAL<br />

LAYER<br />

PROCEDE DE FORMATION D’UN RE-<br />

LIEF A LA SURFACE D’UNE COUCHE<br />

FONCTIONNELLE<br />

(71, 72) RAKHOVSKY, Vadim Izrailovich<br />

[RU/RU]; B.Konjushkovsky per., 27a-17,<br />

Moscow, 123242 (RU).<br />

(74) OBSCHESTVO S OGRANICHENNOI<br />

OTVETSTVENNOSTIJU "ANTEKH";<br />

Kazarmenny per.,<br />

(RU).<br />

(81) CA DE JP US.<br />

6-1, Moscow, 109028<br />

(84) EP (AT BE CH CY DE DK ES FI FR GB GR<br />

IE IT LU MC NL PT SE TR).<br />

(51) 7 G03F 7/004<br />

(11) WO 01/37047 (13) A2<br />

(<strong>21</strong>) <strong>PCT</strong>/US00/31136<br />

(22) 14 <strong>No</strong>v/nov 2000 (14.11.2000)<br />

(25) en (26) en<br />

(30) 60/166,035 17 <strong>No</strong>v/nov 1999 US<br />

(17.11.1999)<br />

(43) 25 May/mai <strong>2001</strong> (25.05.<strong>2001</strong>)<br />

(54) NITRILE/FLUOROALCOHOL-CON-<br />

TAINING PHOTORESISTS AND AS-<br />

SOCIATED PROCESSES FOR MI-<br />

CROLITHOGRAPHY<br />

PHOTORESISTS A BASE DE NI-<br />

TRILE/FLUOROALCOOL ET PRO-<br />

CEDES DE MICROLITHOGRAPHIE<br />

ASSOCIES<br />

(71) E.I. DU PONT DE NEMOURS AND<br />

COMPANY [US/US]; 1007 Market Street,<br />

Wilmington, DE 19898 (US).<br />

(for all designated States except / pour tous<br />

les États désignés sauf US)<br />

(72, 75) FRYD, Michael [US/US]; 50 East<br />

Maple Avenue, Moorestown, NJ 08057 (US).<br />

SCHADT, Frank, Leonard, III [US/US];<br />

2407 Delaware Avenue, Wilmington, DE<br />

19806 (US). PERIYASAMY, Mookkan<br />

[US/US]; 2623 Pennington Drive, Wilmington,<br />

DE 19806 (US).<br />

(74) SINNOTT, Jessica, M.; E.I. Du Pont de<br />

Nemours and Company, Legal Patent Records<br />

Center, 1007 Market Street, Wilmington, DE<br />

19898 (US).<br />

(81) AE AG AL AM AT AU AZ BA BB BG BR<br />

BY BZ CA CH CN CR CU CZ DE DK DM<br />

DZ EE ES FI GB GD GE GH GM HR HU<br />

ID IL IN IS JP KE KG KP KR KZ LC LK<br />

LR LS LT LU LV MA MD MG MK MN MW<br />

MX MZ NO NZ PL PT RO RU SD SE SG SI<br />

SK SL TJ TM TR TT TZ UA UG US UZ VN<br />

YU ZA ZW.<br />

(84) AP (GH GM KE LS MW MZ SD SL SZ TZ<br />

UG ZW); EA (AM AZ BY KG KZ MD RU<br />

TJ TM); EP (AT BE CH CY DE DK ES FI<br />

FR GB GR IE IT LU MC NL PT SE TR); OA<br />

(BF BJ CF CG CI CM GA GN GW ML MR<br />

NE SN TD TG).<br />

(51) 7 G03F 7/027, 7/035, C08G 18/80<br />

(11) WO 01/37048 (13) A1<br />

(<strong>21</strong>) <strong>PCT</strong>/JP00/08026<br />

(22) 14 <strong>No</strong>v/nov 2000 (14.11.2000)<br />

(25) ja (26) ja<br />

(30) 11/325298 16 <strong>No</strong>v/nov 1999<br />

(16.11.1999)<br />

(43) 25 May/mai <strong>2001</strong> (25.05.<strong>2001</strong>)<br />

JP<br />

(54) PHOTOSENSITIVE COMPOSITION<br />

AND PRODUCTS OF CURING<br />

THEREOF<br />

COMPOSITION PHOTOSENSIBLE ET<br />

PRODUITS POUR LA DURCIR<br />

(71) MITSUBISHI CHEMICAL CORPORA-<br />

TION [JP/JP]; 5-2, Marunouchi 2-chome,<br />

Chiyoda-ku, Tokyo 100-0005 (JP).<br />

(for all designated States except / pour tous<br />

les États désignés sauf US)<br />

(72, 75) KUSAKA, Hisashi [JP/JP]; c/o Mitsubishi<br />

Chemical Corporation Yokkaichi<br />

Plant, 1, Toho-cho, Yokkaichi-shi, Mie<br />

510-0848 (JP). HATA, Kazuyuki [JP/JP];<br />

c/o Mitsubishi Chemical Corporation<br />

Yokkaichi Plant, 1, Toho-cho, Yokkaichi-shi,<br />

Mie 510-0848 (JP). SOEJIMA, Yuuji<br />

[JP/JP]; c/o Mitsubishi Chemical Corporation,<br />

Yokohama Research Center, 1000,<br />

Kamoshida-cho, Aoba-ku, Yokohama-shi,<br />

Kanagawa 227-0033 (JP).<br />

(74) OGURI, Shohei et al. / etc.; Eikoh Patent<br />

Office, Ark Mori Building, 28th Floor,<br />

12-32, Akasaka 1-chome, Minato-ku, Tokyo<br />

107-6028 (JP).<br />

(81) CN KR SG US.<br />

(84) EP (AT BE CH CY DE DK ES FI FR GB GR<br />

IE IT LU MC NL PT SE TR).<br />

(51) 7 G03F 7/075, C08L 83/07, C08G 77/20,<br />

G02B 6/12, C08J 7/18, G02B 5/18, 1/04<br />

(11) WO 01/37049 (13) A1<br />

(<strong>21</strong>) <strong>PCT</strong>/JP00/07949<br />

(22) 10 <strong>No</strong>v/nov 2000 (10.11.2000)<br />

(25) ja (26) ja<br />

(30) 11/323005 12 <strong>No</strong>v/nov 1999 JP<br />

(12.11.1999)<br />

(43) 25 May/mai <strong>2001</strong> (25.05.<strong>2001</strong>)<br />

(54) PHOTOSENSITIVE COMPOSITION,<br />

AND OPTICAL WAVEGUIDE ELE-<br />

MENT AND PROCESS FOR PRODUC-<br />

ING THE SAME<br />

COMPOSITION PHOTOSENSIBLE,<br />

ELEMENT A GUIDE D’ONDE OP-<br />

TIQUE ET PROCEDE DE PRODUC-<br />

TION DUDIT ELEMENT<br />

(71) NIPPON SHEET GLASS CO., LTD.<br />

[JP/JP]; 5-11, Doshomachi 3-chome,<br />

Chuo-ku, Osaka-shi, Osaka 541-0045 (JP).<br />

(for all designated States except / pour tous<br />

les États désignés sauf US)<br />

(72, 75) NAKAMURA, Koichiro [JP/JP]; Nippon<br />

Sheet Glass Co., Ltd., 5-11, Doshomachi<br />

3-chome, Chuo-ku, Osaka-shi, Osaka<br />

541-0045 (JP).<br />

(74) OHSHIMA, Masataka; Ohshima Patent Office,<br />

Fukuya Building, 3, Yotsuya 4-chome,<br />

Shinjuku-ku, Tokyo 160-0004 (JP).<br />

(81) CA CN JP US.<br />

(84) EP (AT BE CH CY DE DK ES FI FR GB GR<br />

IE IT LU MC NL PT SE TR).<br />

(51) 7 G03F 7/11, 7/038, H01L <strong>21</strong>/768<br />

(11) WO 01/37050 (13) A1<br />

(<strong>21</strong>) <strong>PCT</strong>/EP00/11448<br />

(22) 17 <strong>No</strong>v/nov 2000 (17.11.2000)<br />

(25) de (26) de<br />

(30) 199 55 969.4 19 <strong>No</strong>v/nov 1999<br />

(19.11.1999)<br />

DE

Hooray! Your file is uploaded and ready to be published.

Saved successfully!

Ooh no, something went wrong!