Cap 11 Fotoresisit Uno e Due Fotoni - Scienza dei Materiali
Cap 11 Fotoresisit Uno e Due Fotoni - Scienza dei Materiali
Cap 11 Fotoresisit Uno e Due Fotoni - Scienza dei Materiali
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Microstrutture ottenute da negative tone photoresists<br />
Ti:sapphire laser pulses (150 fs, 76MHz, ,0.35mm radial spot size) at a wavelength near the two-photon<br />
absorptionpeak of the initiator. The substrate was translated at 50 mm s-1 in a programmed3D pattern<br />
during the exposure. The ®lms were developed with an N,Ndimethylformamidewash<br />
34<br />
Pho.B.O.S.
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