Analysis of the extended defects in 3C-SiC.pdf - Nelson Mandela ...
Analysis of the extended defects in 3C-SiC.pdf - Nelson Mandela ...
Analysis of the extended defects in 3C-SiC.pdf - Nelson Mandela ...
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75<br />
Fig. 7.5. The stack<strong>in</strong>g fault selected for simulation with arrows po<strong>in</strong>t<strong>in</strong>g to <strong>the</strong><br />
thickness fr<strong>in</strong>ges used for foil thickness determ<strong>in</strong>ation<br />
To verify <strong>the</strong> suggested nature <strong>of</strong> <strong>the</strong> fault image, simulation and match<strong>in</strong>g was<br />
performed. Fig. 7.5. shows a magnified bright field TEM micrograph <strong>of</strong> <strong>the</strong> SF shown<br />
<strong>in</strong> Fig. 7.4. This fault was selected for <strong>the</strong> simulation and <strong>the</strong> assumed fault vector and<br />
partial dislocation burgers vectors were used. Follow<strong>in</strong>g this, <strong>the</strong> unknowns <strong>of</strong> <strong>the</strong><br />
problem were determ<strong>in</strong>ed start<strong>in</strong>g with foil thickness. This was done us<strong>in</strong>g <strong>the</strong><br />
thickness fr<strong>in</strong>ges present <strong>in</strong> <strong>the</strong> micrograph as well as <strong>the</strong> technique <strong>of</strong> convergent<br />
beam electron diffraction (CBED) (De Graef (2003)).<br />
Thickness fr<strong>in</strong>ge method<br />
Consider Fig. 7.5. It is known that <strong>the</strong> thickness fr<strong>in</strong>ges present <strong>in</strong> a bright field (or<br />
dark field) micrograph follow <strong>in</strong> <strong>in</strong>crements <strong>of</strong> 1/2ξ (ξ is ext<strong>in</strong>ction distance) for each<br />
successive bright to dark fr<strong>in</strong>ge start<strong>in</strong>g from <strong>the</strong> edge <strong>of</strong> <strong>the</strong> material (Hirsch et al.<br />
(1965)). Thus <strong>in</strong> this case <strong>the</strong> foil thickness was found to be approximately 2.75 ξ at<br />
<strong>the</strong> po<strong>in</strong>t <strong>of</strong> <strong>the</strong> fault us<strong>in</strong>g <strong>the</strong> thickness fr<strong>in</strong>ges as <strong>in</strong>dicated. Us<strong>in</strong>g this and <strong>the</strong><br />
ext<strong>in</strong>ction distance <strong>of</strong> <strong>the</strong> {111} reflection <strong>in</strong> <strong>3C</strong>-<strong>SiC</strong> <strong>the</strong> thickness was determ<strong>in</strong>ed to<br />
be ~ 188 nm. A value <strong>of</strong> 622 Å was used for <strong>the</strong> ext<strong>in</strong>ction distance and was found<br />
us<strong>in</strong>g Electron Diffraction (2003).<br />
3 ξ<br />
~2.75 ξ<br />
2 ξ<br />
5/2 ξ<br />
3/2 ξ