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Complete Report - University of New South Wales

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During 2005, we have devoted signifi cant effort to optimising and upscaling <strong>of</strong> the AIT glass<br />

texturing process. We found that considerable freedom is available for varying conditions<br />

used in the AIT process, and that these conditions affect the morphology <strong>of</strong> the resulting<br />

texture. Prime determinants are the Al layer thickness, anneal temperature pr<strong>of</strong>i le, as well<br />

as HF-nitric acid ratio and immersion time. For example, Fig. 4.4.3 shows FIB microscope<br />

images <strong>of</strong> the surface (plus cross section) <strong>of</strong> 2.3 µm thick SPC poly-Si fi lms deposited by<br />

PECVD onto three different AIT-textured glass sheets. All were AIT-annealed at a maximum<br />

temperature <strong>of</strong> 630°C, with differing temperature pr<strong>of</strong>i les. The Al thickness and HF-nitric<br />

mixture are varied as follows: 200 nm and 1:20 for sample (a), 400 nm and 1:1 for sample<br />

(b), 600 nm and 1:20 for sample (c). The HF-nitric immersion time was kept to the minimum<br />

needed to remove the silicon residue.<br />

All samples had a similar Voc <strong>of</strong> about 400 mV after the same SPC crystallisation, rapid<br />

thermal anneal (RTA) and hydrogenation steps, despite the large variation in surface<br />

morphology. In another experiment, AIC seed layers were prepared on the above three AIT<br />

textures. The Al was evaporated, whereas the a-Si was deposited by sputtering. Only sample<br />

(b) was free <strong>of</strong> pinholes, indicating its promising potential for general use with evaporated<br />

silicon solar cells.<br />

Sample (a) Sample (b) Sample (c)<br />

Figure 4.4.3: Microscope images (with milled trenches to reveal the samples’ cross sections)<br />

<strong>of</strong> 2.3 µm thick PECVD-based SPC poly-Si fi lms on three AIT-textured glass sheets. The<br />

samples’ structure is: 3.3 mm glass /70 nm SiN /100 nm n++ /2100 nm p- /100 nm p+.<br />

Figure 4.4.4 shows the total measured optical absorption 1-R-T (where R is the sample’s<br />

refl ection and T is its transmission) for the three poly-Si samples, along with that for a planar<br />

PECVD-based poly-Si fi lm with the same layer structure and treatment, in the superstrate<br />

confi guration. These curves are compared with a randomising texture with zero refl ection<br />

at the glass-silicon interface and no back refl ector (top curve; calculated with the s<strong>of</strong>tware<br />

WVASE). In these measurements, light was collected by an integrating sphere and the<br />

Edwards mount was used. In this arrangement, the sample is placed in the centre <strong>of</strong> the<br />

integrating sphere and the beam is collimated to illuminate only a small, central area <strong>of</strong> the<br />

sample. All light emerging from the sample is collected, including R, T, and light from the<br />

edges <strong>of</strong> the glass (the latter can be signifi cant for textured samples at weakly absorbed<br />

wavelengths, particularly with thick glass). Because edge leakage reduces coupling <strong>of</strong> light<br />

with the sample, the absorption measured at these wavelengths for the textured samples<br />

underestimates what would be absorbed in a larger solar cell module. Thus, we can say that<br />

the centremount-derived curves in Fig. 4.4.4 represent a conservative estimate <strong>of</strong> the true<br />

absorption for the textured samples.<br />

56

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