Complete Report - University of New South Wales
Complete Report - University of New South Wales
Complete Report - University of New South Wales
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4.5.3.1.3 Grazing Incidence X-Ray Diffraction (GIXRD)<br />
During 2005 X-ray diffraction (XRD) analysis has been developed for the Si nanostructure<br />
samples. This gives information on crystallinity, nanocrystal size and crystal fraction and<br />
potentially on nanocrystal size distribution, shape and any preferred orientation. The<br />
technique is complementary to TEM analysis and has the advantage that very little sample<br />
preparation is required.<br />
Two approaches have been used: analysis using X-ray tube diffractometers in the School <strong>of</strong><br />
Materials Science at UNSW and analysis using synchrotron XRD at the Australian Nuclear<br />
Beamline Facility, Tsukuba, Japan.<br />
In both cases the experiments aimed to measure XRD from the thin-fi lms at grazing<br />
Incidence (GIXRD). Figure 4.5.8 shows a result using X-ray tube for a sample with 62 bilayers<br />
<strong>of</strong> alternating 4.5nm SRO/SiO 2 layers (sample DK24) [SRO refers to silicon rich oxide]. It<br />
confi rms that (at least for this sample):<br />
• The lattice constant given by the {111} peak does not vary from the bulk silicon value<br />
by more than 0.2%.<br />
• The average Si nanocrystal size is 4.5nm - thus for this sample, the SRO layer<br />
thickness controlled the size <strong>of</strong> the nanocrystals.<br />
• There was no measurable microstrain present in the nanocrystals (i.e. no small<br />
variations <strong>of</strong> lattice constant from dot to dot).<br />
• The crystal orientations <strong>of</strong> the dots were perfectly random.<br />
Figure 4.5.8: X-ray tube<br />
XRD <strong>of</strong> a 62 bi-layer,<br />
4.2nm, SRO/SiO2<br />
sample.<br />
An important aspect <strong>of</strong> the analysis is comparison <strong>of</strong> X-ray tube with synchrotron XRD data<br />
and comparison <strong>of</strong> both with information from TEM. Figure 4.5.9 shows two-theta plots <strong>of</strong><br />
the same Si QD in nitride sample for which the TEM is shown in Figure 4.5.7. The sample has<br />
20 bilayers <strong>of</strong> 10nm Si rich nitride layers. It shows that:<br />
• The average Si nanocrystal size is 4.3nm – thus for this sample the SRO layer<br />
thickness was too thick to control the nanocrystal size.<br />
• Lattice parameter has less than 0.1% deviation from bulk value.<br />
• Deviation <strong>of</strong> intensities from random orientation are less than 10%.<br />
The presence <strong>of</strong> crystalline Si is clear from these plots. In terms <strong>of</strong> quantitative analysis, the<br />
viability <strong>of</strong> both techniques for extracting average size, strain and lattice parameters <strong>of</strong> the<br />
nanocrystals is being examined.<br />
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