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Complete Report - University of New South Wales

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The fact that the SPE diodes are n=1 limited strongly suggests that the voltage problem is<br />

not associated with grain boundaries or the p-n junction depletion region. Investigation <strong>of</strong><br />

the active doping levels in the base and emitter regions <strong>of</strong> the SPE cells is in progress, but it<br />

should be noted that the 393-mV SPE diode had no intentionally different doping level from<br />

that <strong>of</strong> the 463-mV SPC diode.<br />

From the results obtained in this study it is clear that SPE poly-Si material grown on AICseeded<br />

glass has a signifi cantly better crystal quality compared to SPC poly-Si material grown<br />

on bare (i.e., non-seeded) glass. So far, this advantage has not been translated into superior<br />

photovoltaic performance. Analysis <strong>of</strong> Suns-Voc curves indicates that the problem lies in the<br />

absorber region and/or the emitter region <strong>of</strong> the SPE diodes.<br />

10..0<br />

2-diode model<br />

Light Intensity (suns)<br />

1.0<br />

0.1<br />

n=1<br />

Exp. data<br />

n=2<br />

Figure 4.4.18: Suns-Voc data<br />

(symbols) and 2-diode model analysis<br />

(solid lines) <strong>of</strong> sample SPE-A.<br />

0.0<br />

0.36<br />

0.38 0.40 0.42 0.44 0.46 0.46<br />

Voltage (V)<br />

Table 4.4.2: Suns-Voc data <strong>of</strong> samples SPE-A, SPE-B and SPC.<br />

Sample p-n junction location 1-Sun Voc n=1 Voc n= 2 Voc<br />

SPE-A glass side 423 424 561<br />

SPE-B air side 393 401 499<br />

SPC glass side 463 474 523<br />

4.4.10 Optimisation <strong>of</strong> the Rapid Thermal Annealing and Hydrogenation<br />

Processes<br />

Due to the fabrication process and structure <strong>of</strong> poly-Si thin-fi lm solar cells, defects are<br />

present in the material. These defects can drastically reduce the open-circuit voltage (Voc)<br />

and the short-circuit current (Jsc) <strong>of</strong> the device. As such, the removal <strong>of</strong> these defects is<br />

essential and is typically done via thermal annealing and subsequent hydrogen passivation. An<br />

additional concern is achieving complete activation <strong>of</strong> dopants within the device.<br />

Thermal annealing is well known to dramatically reduce defects and also to activate dopants.<br />

Traditionally this annealing has been done in a tube furnace. Rapid thermal annealing (RTA)<br />

has replaced the tube furnace in many applications. RTA processes are ideally suited for<br />

poly-Si thin-fi lm solar cells on glass substrates [4.4.18 - 4.4.21] as precise control <strong>of</strong> the<br />

thermal pr<strong>of</strong>i le the device receives can be achieved. It is well known that hydrogen passivation<br />

(hydrogenation) is crucial in passivating defects. In thin-fi lm devices this hydrogenation is<br />

typically done using an RF or microwave plasma. The Voc is typically more than doubled and<br />

the Jsc is tripled by the hydrogenation step [4.4.18 - 4.4.21]. The combination <strong>of</strong> these two<br />

processes is critical in drastically improving poly-Si thin-fi lm solar cells.<br />

65

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