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1. magnetic confinement - ENEA - Fusione

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116<br />

4. MISCELLANEOUS<br />

4.4 Advanced Superconducting<br />

Materials and Devices<br />

freely rotating sample holder to incline the substrate normal with respect to the<br />

vapour incidence direction of an angle α.<br />

At normal incidence (α=0°), the CeO 2 film showed a fibre texture, with the [111]<br />

direction normal to the substrate and no in-plane texture. On inclining the substrate,<br />

a biaxial textured growth of CeO 2 films is induced (fig. 4.5). The [00l] axis is tilted<br />

relative to the substrate normal n of an angle γ in the opposite direction with respect<br />

to the incidence of the vapour flux. The (200) and (020) poles, at the same χ angle, are<br />

well defined, indicating a high degree of texture. The φ-scan FWHM values decrease<br />

rapidly on increasing α from 15° to 45°, and become almost constant between 45° and<br />

75° (fig. 4.6a). The film thickness has an important influence on the degree of texture:<br />

films more than 1-µm thick show a sharp texture, as can be seen from the φ–scan<br />

FWHM value reported in figure 4.6b.<br />

Qualitatively, the texturing of ISD-CeO 2 film can be explained by considering the<br />

anisotropic growth rate of crystal planes and the anisotropic diffusion along different<br />

crystal directions. In general, films preferentially grow with the fast growing plane<br />

perpendicular to the vapour flux. Typically in fcc materials, such as CeO 2 , the fast<br />

growing plane is the close-packed {111} plane. In the inclined configuration, the same<br />

growth mechanism is present and the {111} planes are the top planes of the column.<br />

These planes are not exactly orthogonal to the vapour incidence direction because of<br />

directional diffusion, which is due to the momentum conservation of the adsorbed<br />

atom parallel to the film surface. Directional diffusion is also responsible for CeO 2<br />

in-plane alignment. The grains that present the crystallographic direction with the<br />

highest diffusion rate aligned with the directional diffusion can grow more than the<br />

other grains, due to a higher mass transport effect. In ISD-CeO 2 films, this direction<br />

coincides with the direction along the {111} planes. The bigger grains mask the<br />

other grains, hence promoting a selection of film orientation; texture improves with<br />

film thickness.<br />

Fig. 4.5 - X-ray (002)<br />

CeO 2 pole figures for<br />

<strong>1.</strong>5-mm-thick film<br />

deposited at α=55° and<br />

Tsub=200°C in vacuum.<br />

The arrow indicates the γ<br />

angle; the ×, the<br />

deposition direction.<br />

φ-scan FWHM (degrees)<br />

40<br />

30<br />

20<br />

10<br />

10 20 30 40 50 60 70 80<br />

α (degrees)<br />

FWHM<br />

γ<br />

a) b)<br />

90<br />

FWHM 90<br />

40<br />

γ<br />

60<br />

γ (degrees)<br />

φ-scan FWHM (degrees)<br />

30<br />

20<br />

10<br />

0 0,5 1 1,5 2<br />

thickness (µm)<br />

60<br />

γ (degrees)<br />

Fig. 4.6 - φ-scan FWHM<br />

and γ angle values for<br />

CeO 2 film deposited at<br />

Tsub=200°C in vacuum a)<br />

vs. α value (<strong>1.</strong>5-µm-thick<br />

samples) and b) vs. film<br />

thickness (samples<br />

deposited at α=55°).<br />

4.4.4 MgB 2<br />

film fabrication<br />

Different fabrication techniques were used for MgB 2 films on single crystal<br />

substrates. Two main methods were followed: as grown, performed by pulsed laser<br />

deposition (PLD) and in situ annealing, performed both by PLD and by electron<br />

beam evaporation.<br />

In the as-grown method, the MgB 2 film is deposited directly on the single-crystal<br />

substrate, which is heated at a certain deposition temperature in an inert gas<br />

atmosphere.

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