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Star-Hspice Quick Reference Guide

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MOSFET Models<br />

channel effect defined by LRSCE (and NBH or NHALO);<br />

the latter effect is also turned off when WKF is specified.<br />

• For floating-body devices, set CGFBO=0.<br />

• JRO and SEFF influence the gain of the BJT, but LDIFF<br />

affects only bipolar charge storage in the source/drain. The<br />

BJT gain is influenced by NBH and NHALO (if THALO is<br />

specified) as well.<br />

• The (non-local) impact-ionization model is physical, and its<br />

parameters should not be varied arbitrarily.<br />

• The LDD option intensifies the model; set LLDD=0 for<br />

large-scale circuit simulation, and add the unbiased LDD<br />

resistance to RD. This simplification will stop if NLDD ><br />

1e19.<br />

LEVEL 59 UC Berkeley BSIM3-SOI FD Model<br />

General Form Mxxx nd ng ns ne mname <br />

+ <br />

+ <br />

+ <br />

+ <br />

+ <br />

AD<br />

Drain diffusion area<br />

AS<br />

Source diffusion area<br />

BJTOFF Turning off BJT if equal to 1<br />

CTH0 Thermal capacitance per unit width<br />

IC<br />

Initial guess in the order<br />

10-24 <strong>Star</strong>-<strong>Hspice</strong> <strong>Quick</strong> <strong>Reference</strong> <strong>Guide</strong>

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