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William Angerer - Department of Physics and Astronomy - University ...

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118<br />

Parameter Symbol Value<br />

electron mobility f..le 350 cm- 2 / Vs [65J<br />

electron concentration (undoped) ne '" 10 17 cm- 3 [81J<br />

electron concentration (doped) ne '" 10 19 cm- 3 [82J<br />

hole mobility f..lh 20 em -2 IV s [83J<br />

hole concentration nh 4.5xl017 cm- 3<br />

temperature.<br />

Table 5.2: GaN electrical properties<br />

5.2.2 Electronic Properties<br />

Control <strong>of</strong> the electrical properties <strong>of</strong> GaN is one <strong>of</strong> the largest obstacles to improving<br />

GaN electro-optical device properties. U ndoped GaN displays high electron concentrations<br />

(see Table .5.2.)<br />

These high electron concentrations may result from the<br />

formation <strong>of</strong> native donors that introduce electrons with energies near the valence<br />

b<strong>and</strong> [79]. These donors act as an efficient compensation mechanism that hinders<br />

p-doping <strong>of</strong> GaN. For example, incorporation <strong>of</strong> '" 6 x 10 19 cm- 3 Mg acceptors into<br />

the GaN lattice results in a hole concentration <strong>of</strong>"-' 5 x 10 17 cm- 3 [80J. An overview<br />

<strong>of</strong> defects in GaN in presented in section 5.3.<br />

Reproduced with permission <strong>of</strong> the copyright owner. Further reproduction prohibited without permission.

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