Turbomolecular Pumps TURBOVAC and MAG - Granzow

Turbomolecular Pumps with Magnetic Rotor Suspension
with Compound Stage
TURBOVAC MAG W 2000 C/CT
Typical Applications
- All major semiconductor processes
such as Etch, CVD, PVD and Ion
Implantation
Technical Features
- Active 5-axis magnetic bearing
system
- Patented KEPLA-COAT® for rotor
and stator to prevent corrosion
- Low noise and vibration levels
- Installation in any orientation
Only CT
ød 1
ød
Only CT
Top view
- Compound rotor design for high
pumping speed and foreline
pressure
- Integrated purge gas system
h 5
Only CT
h 1
h 2
d 2
h 3 30°
h
ød 4
- CT versions: Integrated temperature
management system
ød 5
DN 40
ød 3
h 4
Only CT
Advantages to the User
- Maintenance-free
- High throughput for all etch gases
d d 1 d 2 d 3 d 4 d 5 h h 1 h 2 h 3 h 4 h 5
mm 335 310 335 199 284 11 303 272 318 386 40 16
in. 13.19 12.20 13.19 7.83 11.18 0.43 11.93 10.71 12.52 15.20 1.57 0.63
Dimensional drawing for the TURBOVAC MAG W 2000 C/CT
Pumping Speed
10000
I x s -1
1000
100
- High pumping speed at low
pressure
- High foreline pressure tolerance:
up to 5.3 mbar (4 Torr)
- High resistance against corrosive
gases
- Robust against particles and deposits
- Temperature management system
to avoid condensation
- Application specific design
10
8
6
4
N 2
He
H 2
2
1
10 -4
2 4 6 8
10 -3 10 -2 10 -1 mbar
Inlet Pressure
10
Pumping speed of the TURBOVAC MAG W 2000 CT (DN 250) as a function of the inlet pressure
C09 90 Oerlikon Leybold Vacuum Full Line Catalog