Operation and Maintenance Manual for

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LC Manual 11/02 Rev. 3 SYSTEM MAINTENANCE C. Cleaning Instructions CAUTION 1. Connect the RO system cleaning port (CP) connections to the accessory cleaning skid. Flexible hose and tubing work best to connect the cleaning equipment with the system. The materials of construction of the valves and hose must be compatible with the cleaning solutions. Verify that all piping connections are secure. 2. Mix the desired cleaning solution in the tank and warm to appropriate cleaning temperature. 3. Pump the mixed cleaning solution into the RO system at low pressure at a flow rate of 3-5 gpm per vessel. The pressure should be low enough that essentially no permeate is produced. 4. Recirculate the cleaning solution through the RO system for 10 – 15 minutes. 5. Turn off the cleaning pump and allow the RO membranes to soak in the cleaning solution. The soak period may range from 1 hour to overnight, depending on how severely fouled the membranes are. Turn on the cleaning pump periodically to circulate the cleaning solution. If the cleaning solution becomes highly discolored during recirculation, discard it and repeat the application. 6. Recirculate the cleaning solution at 3-5 gpm per vessel for 30-60 minutes. This high flow rate flushes out foulants removed from the RO membranes. If the system temperature approaches the maximum recommended operation temperature during recirculation, shut down the system and allow it to cool off before continuing the recirculation. 7. Disconnect the RO system from the cleaning skid. Divert the product and reject lines to drain. 8. Flush the cleaning solution from the system, starting with a 10 to 15 minute manual flush cycle. Then place the system in the normal operating mode, and for the first ten minutes, reduce the feed pressure to approximately half of the normal operating pressure by opening the reject and reject recycle throttle valves. This prevents residual foulants from being impacted into the membrane. After ten minutes, return the system to normal operating pressure, and continue flushing until the product water is clear of all residual cleaning agents. To test for residual cleaning agents when using an acid or base, the pH of the product water would be equal to, or nearly equal to, the pH of the feed water. For other chemicals, the conductivity of the product should be equal to, or less than, the conductivity of the product before cleaning. USFilter 4-7
SYSTEM MAINTENANCE LC Manual 11/02 Rev. 3 Table 4-2: Cleaning Solutions for Polyamide Thin Film Composite Membranes. 0.1% (W) 1 NaOH and pH12, 30°C max. or 1.0% (W) Na4EDTA and pH12, 30°C max. 0.1% (W) 1 NaOH and pH12, 30°C max. or 0.025% (W) NaDSS and pH12, 30°C max. 0.1% STP and 1.0% (W) 1 Na4EDTA or 1.0% TSP and pH12, 30°C max. Inorganic Salts 2 Metal Oxides (Iron) 0.2% (W) 1 HCl BEST 0.5% (W) 1 H3PO4 OK GOOD 2.0% (W) 1 Citric Acid OK 1.0% (W) 1 Na2S2O4 GOOD NOTES: 1. (W) Denotes weight percent of active ingredient. Inorganic Colloids (Silt) Silica Biofilms Organics OK BEST OK GOOD GOOD GOOD GOOD GOOD 2. Inorganic Salts: CaCO3=Calcium Carbonate; CaSO4=Calcium Sulfate; BaSO4=Barium Sulfate. 3. Cleaning chemical symbols: NaOH=Sodium Hydroxide; Na4EDTA is the Tetrasodium Salt of Ethyl Diamine Tetraacetic acid; NaDSS is Sodium Salt of Dodecylsulfate; STP is Sodium Triphosphate (Na5P3O10); TSP is Trisodium Phosphate (Na3PO4·12H2O); HCl is Hydrochloric Acid; H3PO4 is Phosphoric Acid; C3H4(OH)(CO2H)3 is Citric Acid; Na2S2O4 is Sodium Hydrosulfite. 4.4 MAINTENANCE SCHEDULE NOTE: The maintenance schedule for monitoring outlined is a minimum for the protection of the RO system. A more frequent monitoring schedule may be necessary. Consult your local U.S. Filter representative or call U.S. Filter, Technical Service Department at the number provided on the cover of this manual for assistance. Refer to the RO Data Collection Form in the Appendix. 4-8 USFilter
Page 1 and 2: USFilter 10 Technology Drive Lowell
Page 3 and 4: This manual discloses information i
Page 5 and 6: TABLE OF CONTENTS SECTION DESCRIPTI
Page 7 and 8: LC Manual 11/02 Rev. 3 INTRODUCTION
Page 9 and 10: LC Manual 11/02 Rev. 3 INTRODUCTION
Page 11 and 12: LC Manual 11/02 Rev. 3 SYSTEM INSTA
Page 13 and 14: LC Manual 11/02 Rev. 3 SYSTEM INSTA
Page 15 and 16: LC Manual 11/02 Rev. 3 OPERATING IN
Page 21 and 22: SYSTEM MAINTENANCE LC Manual 11/02
Page 25: SYSTEM MAINTENANCE LC Manual 11/02
Page 31 and 32: TROUBLESHOOTING LC Manual 11/02 Rev
Page 33 and 34: LC Manual 11/02 Rev. 3 WARRANTY 6.1
Page 35 and 36: APPENDIX LC Manual 11/02 Rev. 3 7.1
Page 41 and 42: APPENDIX LC Manual 11/02 Rev. 3 RO
Page 45 and 46: Product Description/Equipment Speci
Page 47 and 48: Process Water Systems General Speci
Page 49 and 50: Process Water Systems Low feed pres
Page 51 and 52: Process Water Systems Skid Cleaning
Page 53 and 54: Series 1, 2 & 3 Pumps Page 1 of 2 [
Page 55 and 56: Product Information FILMTEC Membran
Page 57 and 58: USFilter USFilter USFilter USFilter
Page 59 and 60: Conventions and Symbols ii Special
Page 61 and 62: Table of Contents iv MC10 Overview
Page 63 and 64: Specifications The MC10 incorporate
Page 65 and 66: ! The MC10 may be configured to use
Page 67 and 68: Installation 2 Environmental The MC
Page 69 and 70: I/O The wiring diagram for the inpu
Page 71 and 72: Operation 3 Controls The MC10 is ho
Page 73 and 74: Sequence The normal startup and shu
Page 75 and 76: 7 Perm Divert TD Sec 8 High Temp SP
Page 77 and 78:
Time Delays Time delays and deadban
Page 79 and 80:
Important Please note: • Temperat
Page 81 and 82:
Troubleshooting 5 The MC10 Reverse
Page 83 and 84:
Type of Problem Possible Cause or S
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