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TPF-C Technology Plan - Exoplanet Exploration Program - NASA

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<strong>Plan</strong> for <strong>Technology</strong> Development<br />

7.4.9 Small Precision Optics<br />

Scope<br />

The key issues for masks are surface roughness, transmitted wavefront, and material<br />

homogeneity. We will fabricate and test substrates that meet the mask PSD requirements with<br />

emphasis on 15-100 micron spatial scales.<br />

For the cube beamsplitters, stress birefringence is identified as the primary limiting factor. Two<br />

approaches will be explored: redesign to eliminate cube beamsplitters and work with<br />

manufacturers to develop techniques and materials for ultralow-stress birefringence.<br />

For the remaining small optics, we will work with manufacturers to obtain 1 nm surface flatness<br />

on mounted optics. The small precision optics have achieved TRL 3.Their schedule is given in<br />

Table 7-10.<br />

Table 7-10. Small Precision Optics Schedule<br />

<strong>Plan</strong>ned<br />

Completion<br />

Date<br />

<strong>Plan</strong>ned Activities Performance Targets TRL<br />

Pre-Phase A<br />

Work with manufacturers to<br />

define specifications<br />

Set of specifications manufacturers are willing to<br />

attempt<br />

Phase A Build components Substrate meets mask PSD requirements,<br />

1 nm surface flatness for 10-20 cm reflective optics<br />

3<br />

4<br />

119

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