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TPF-C Technology Plan - Exoplanet Exploration Program - NASA

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Figure i-4. Deformable mirror delivered by Xinetics to the HCIT.<br />

The very recent development and adoption of an eighth-order mask design to replace the fourthorder<br />

masks previously baselined have had a major impact on the design and the 2005<br />

technology plan detailed here. At the expense of some system throughput, the system sensitivity<br />

to aberrations is greatly reduced, by more than two orders of magnitude in some cases, as<br />

summarized in Table i-1. This translates into relaxation of a number of the more challenging<br />

mechanical and thermal requirements on the system. This development originated with an<br />

outside collaborator funded through a university contract and was eagerly adopted by the project.<br />

Table i-1. Selected Error Budget Terms at Contrast = 1 × 10 -12 at 4λ/D<br />

Aberration New (8 th Order) Old (4 th Order) Relaxation Ratio<br />

Tilt 4.3 × 10 -2 2.7 × 10 -3 16<br />

Focus 3.8 × 10-3 2.9 × 10 -5 132<br />

Astigmatism 5.3 × 10-3 4.0 × 10-5 132<br />

Coma 1.0 × 10 -3 5.6 × 10 -6 185<br />

Trefoil 2.3 × 10 -3 1.7 × 10 -5 132<br />

Spherical 3.5 × 10 -5 4.9 × 10 -6 7.2<br />

*Aberration units are waves rms at 550 nm.<br />

viii

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