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Tecnai on-line help manual -- Alignments - UT Southwestern

Tecnai on-line help manual -- Alignments - UT Southwestern

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<str<strong>on</strong>g>Tecnai</str<strong>on</strong>g> <strong>on</strong>-<strong>line</strong> <strong>help</strong> <strong>Alignments</strong> 9<str<strong>on</strong>g>Tecnai</str<strong>on</strong>g> 12 Software versi<strong>on</strong> 23 Introducti<strong>on</strong> to electr<strong>on</strong> opticsThe microscope c<strong>on</strong>sists essentially of three parts:1. The electr<strong>on</strong> gun where the beam is generated.2. The lenses, deflecti<strong>on</strong> coils and stigmators that make the image and project it <strong>on</strong> the screen.3. The projecti<strong>on</strong> chamber with <strong>on</strong>e or more types of electr<strong>on</strong> detectors to record images, diffracti<strong>on</strong>patterns, ... (plate camera, TV, ...).The first two topics will be covered in this secti<strong>on</strong>.3.1 Electr<strong>on</strong> gunThe electr<strong>on</strong> beam is generated in the electr<strong>on</strong> gun. Two basic types of gun can be distinguished: thethermi<strong>on</strong>ic gun and the field emissi<strong>on</strong> gun (FEG).• Thermi<strong>on</strong>ic guns are based <strong>on</strong> two types of filaments: tungsten (W) and lanthanum-hexaboride(LaB6) (cerium-hexaboride, CeB6, can also be used instead of LaB6; its performance is roughly thesame as that of LaB6). On modern instruments the different types of thermi<strong>on</strong>ic filaments can beused interchangeably.• The FEG employs either a (thermally-assisted) cold field emitter - as <strong>on</strong> the Philips EM 400-FEG - ora Schottky emitter - as <strong>on</strong> the more recent generati<strong>on</strong>s of FEG microscopes (CM20/CM200 FEG,CM30/CM300 FEG, <str<strong>on</strong>g>Tecnai</str<strong>on</strong>g> F20 and F30).3.1.1 Thermi<strong>on</strong>ic gunThe thermi<strong>on</strong>ic gun (so-called triode or self-biassing gun)c<strong>on</strong>sists of three elements: the filament (cathode), theWehnelt and the anode. The Wehnelt has a potential that ismore negative - the bias voltage - than the cathode itself. Thebias voltage is variable (c<strong>on</strong>trolled by the Emissi<strong>on</strong>parameter) and is used for c<strong>on</strong>trolling the emissi<strong>on</strong> from thefilament. A high bias voltage restricts the emissi<strong>on</strong> to a smallarea, thereby reducing the total emitted current, whilelowering the bias voltage increases the size of the emittingarea and thus the total emissi<strong>on</strong> current.The emitted electr<strong>on</strong>s that pass through the Wehnelt aperture are focused into across-over between the cathode and anode. This cross-over acts as the electr<strong>on</strong>source for the optics of the microscope.The size of the cross-over is determined by the type of filament, the electric field between cathode andanode and by the exit angles of the electr<strong>on</strong>s from the filament. At low bias voltages, electr<strong>on</strong>s areemitted from a larger area of the curved tip of the filament, causing a higher divergence of emissi<strong>on</strong>angles and thus a larger source size. Higher emissi<strong>on</strong> therefore not necessarily improves the brightness(a performance parameter of the emitter, measured in A/cm²srad). In additi<strong>on</strong>, higher emissi<strong>on</strong> increasesthe Coulomb interacti<strong>on</strong> between electr<strong>on</strong>s - the so-called Boersch effect - (some get accelerated, othersdecelerated) which increases the energy spread.

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