Nanotechnology-Enabled Sensors

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162 Chapter 4: Nano Fabrication and Patterning Techniques deposited. For example, in Fig. 4.20 the deposition nanostructured ZnO by RF magnetron sputtering onto different substrates is shown, where the morphology and crystal structure are markedly different on various substrate surfaces. Fig. 4.20 (a) ZnO growth on bare LiTaO3 (left) and gold (right); (b) ZnO growth on aluminum (left) and bare LiNbO3 (right). There are also several modifications that can be made to traditional sputters. Sputters with such modifications include ion-beam sputtering
4.4 Physical Vapor Deposition (PVD) 163 (IBS) and ion-assisted deposition (IAD) , where the substrate is exposed to a secondary ion beam. 44 4.4.3 Ion Plating Ion plating is a technique that is classed between thermal evaporation and sputtering. It employs an electron beam evaporator to evaporate the target material (e.g. chromium or titanium). At the same time plasma is also generated near the substrates. After the evaporated particles pass through plasma, some of them become ionized and sputtering effects takes place on the substrate surface. This produces highly energetic ions of the target material near the substrate. As these ions can be implanted deeper in the surface of the substrate, the adhesion of the thin films to the substrate surface is greatly increased. Also at the substrate’s surface a different material phase, which is the combination of the deposited film and the substrate, is formed. Fig. 4.21 The schematic diagram of an ion plating system.
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Nanotechnology-Enabled Sensors
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Kourosh Kalantar-zadeh RMIT Univers
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Acknowledgments We have been fortun
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viii Contents Chapter 3: Transducti
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x Contents 5.7.1 Scanning Electron
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xii Contents 7.5 Nano-sensors based
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2 Chapter 1: Introduction Nobel lau
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4 Chapter 1: Introduction Fig. 1.2
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6 Chapter 1: Introduction ensure th
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8 Chapter 1: Introduction ments, th
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10 Chapter 1: Introduction aim is t
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12 Chapter 1: Introduction Referenc
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14 Chapter 2: Sensor Characteristic
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64 Chapter 3: Transduction Platform
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100 Chapter 3: Transduction Platfor
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Page 124 and 125: 112 Chapter 3: Transduction Platfor
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212 Chapter 5: Characterization Tec
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Chapter 6: Inorganic Nanotechnology
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6.2 Density and Number of States 28
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2 6.2 Density and Number of States
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6.3 Gas Sensing with Nanostructured
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6.3.7 Surface Modification 6.3 Gas
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This is the dispersion relation for
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6.4 Phonons in Low Dimensional Stru
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335 vibrational degrees of freedom
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337 ing ballistic transport of elec
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339 Fig. 6.36 Nanoresonators made o
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6.5 Nanotechnology Enabled Mechanic
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6.6 Nanotechnology Enabled Optical
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6.7 Magnetically Engineered Spintro
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ferromagnetic haematite (a form of
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References 365 21 E. Comini, G. Fag
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References 367 58 D. E. Williams an
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References 369 96 J. J. Shi, Y. F.
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Chapter 7: Organic Nanotechnology E
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7.2 Surface Interactions 373 can be
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7.2 Surface Interactions 375 Carbox
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7.2 Surface Interactions 377 Fig. 7
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7.2 Surface Interactions 379 There
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Fig. 7.12 The schematic of physical
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Fig. 7.13 Formation of SAMs. 7.2 Su
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7.2 Surface Interactions 385 ple, t
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7.3 Surface Materials and Surface M
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7.4 Proteins in Nanotechnology Enab
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7.4.4 Using Proteins as Nanodevices
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Fig. 7.36 The general structure of
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+ 7.4 Proteins in Nanotechnology En
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7.5 Nano-sensors based on Nucleotid
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Fig. 7.57 The structure of DNA stra
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7.6 Sensors Based on Molecules with
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7.6 Sensors Based on Molecules with
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7.8 Biomagnetic Sensors 7.8 Biomagn
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7.9 Summary 471 metal oxides, carbo
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References 473 19 T. Kunitake, Ange
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63 J. X. Huang, S. Virji, B. H. Wei
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References 477 105 M. Plomer, G. G.
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References 479 145 R. F. Service, S
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7.8 References 481 185 J. Wang, D.
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Remote plasma enhanced CVD (RPECVD)
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Thin film equivalent circuit ... 32
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Optical waveguides ................
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Semiconductor-semiconductor junctio
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About the Authors Dr. Kourosh Kalan
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