Nanotechnology-Enabled Sensors

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194 Chapter 4: Nano Fabrication and Patterning Techniques appropriate resist films. These particles have sufficiently short de Broglie wavelengths (
Substrate with a PMMA layer Lift-off 4.9 Nanolithography and Nano-Patterning 195 Fig. 4.47 Electron beam lithography and lift-off process for making Au patterns. Focused Ion Beam (FIB) E-beam writing and development Au deposition FIB systems generally employ a highly focused beam of ions, such as Ga + (as gallium can be used to easily produce a liquid metal ion source), which is raster scanned over the sample surface in a similar manner to an electron beam in a scanning electron microscope. 87 However, it differs from an electron microscope in that the FIB is destructive to the specimen. Atoms on the sample surface are sputtered as the high-energy ions impinge on the sample. Furthermore, gallium atoms from the ion beam are also implanted into the top few nanometers of the sample surface. As can be seen in Fig. 4.48, the primary Ga + ion beam strikes the sample surface. In doing so, a small amount of the material is sputtered and leaves the surface. These can be either neutral atoms (n 0 ) or secondary ions (i + ). Just as in sputtering, the incident ion beam also produces secondary electrons (e - ). Additionally, these secondary electrons, or sputtered ions, may also be collected by the detectors which convert the signal to an image of the surface.
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Nanotechnology-Enabled Sensors
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Kourosh Kalantar-zadeh RMIT Univers
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Acknowledgments We have been fortun
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viii Contents Chapter 3: Transducti
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x Contents 5.7.1 Scanning Electron
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xii Contents 7.5 Nano-sensors based
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2 Chapter 1: Introduction Nobel lau
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4 Chapter 1: Introduction Fig. 1.2
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6 Chapter 1: Introduction ensure th
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8 Chapter 1: Introduction ments, th
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10 Chapter 1: Introduction aim is t
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12 Chapter 1: Introduction Referenc
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14 Chapter 2: Sensor Characteristic
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64 Chapter 3: Transduction Platform
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100 Chapter 3: Transduction Platfor
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136 Chapter 4: Nano Fabrication and
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Page 156 and 157: 144 Chapter 4: Nano Fabrication and
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244 Chapter 5: Characterization Tec
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Chapter 6: Inorganic Nanotechnology
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6.2 Density and Number of States 28
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2 6.2 Density and Number of States
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6.3 Gas Sensing with Nanostructured
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6.3.7 Surface Modification 6.3 Gas
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This is the dispersion relation for
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6.4 Phonons in Low Dimensional Stru
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335 vibrational degrees of freedom
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337 ing ballistic transport of elec
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339 Fig. 6.36 Nanoresonators made o
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6.5 Nanotechnology Enabled Mechanic
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6.6 Nanotechnology Enabled Optical
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6.7 Magnetically Engineered Spintro
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ferromagnetic haematite (a form of
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References 365 21 E. Comini, G. Fag
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References 367 58 D. E. Williams an
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References 369 96 J. J. Shi, Y. F.
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Chapter 7: Organic Nanotechnology E
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7.2 Surface Interactions 373 can be
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7.2 Surface Interactions 375 Carbox
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7.2 Surface Interactions 377 Fig. 7
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7.2 Surface Interactions 379 There
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Fig. 7.12 The schematic of physical
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Fig. 7.13 Formation of SAMs. 7.2 Su
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7.2 Surface Interactions 385 ple, t
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7.3 Surface Materials and Surface M
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7.4 Proteins in Nanotechnology Enab
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7.4.4 Using Proteins as Nanodevices
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Fig. 7.36 The general structure of
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+ 7.4 Proteins in Nanotechnology En
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7.5 Nano-sensors based on Nucleotid
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Fig. 7.57 The structure of DNA stra
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7.6 Sensors Based on Molecules with
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7.6 Sensors Based on Molecules with
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7.8 Biomagnetic Sensors 7.8 Biomagn
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7.9 Summary 471 metal oxides, carbo
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References 473 19 T. Kunitake, Ange
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63 J. X. Huang, S. Virji, B. H. Wei
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References 477 105 M. Plomer, G. G.
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References 479 145 R. F. Service, S
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7.8 References 481 185 J. Wang, D.
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Remote plasma enhanced CVD (RPECVD)
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Thin film equivalent circuit ... 32
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Optical waveguides ................
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Semiconductor-semiconductor junctio
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About the Authors Dr. Kourosh Kalan
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