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CHEMICAL VAPOR DEPOSITION OF THIN FILM MATERIALS FOR ...

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tetragonal shape, which indicates the existence of large tensile stress thin the film. This apparent<br />

strain phenomenon will affect the internal magnetic field and thus change the resonance field.<br />

The much smaller T1 term of 800 ˚C than those of other temperatures coincides with this strain<br />

effect very well. Another behavior is the increasing magnetocrystalline anisotropy field (<br />

with increasing deposition temperature, which might be attributed to the increased single crystal<br />

quality of the as deposited thin films. The as listed spectroscopic splitting g factor (also known as<br />

Landé g factor) has a relationship with the gyromagnetic ratio:<br />

93<br />

, in which and are<br />

Bohr magneton and reduced Planck constant, respectively. The values of as calculated g factor<br />

are slightly greater than 2, which has been also reported for experimental measurement of other<br />

ferrite materials.[168]<br />

Table 6. Structural and magnetic properties of nickel ferrite films deposited at different temperatures.<br />

Structural and magnetic parameters Growth temperature (˚C)<br />

500 600 700 800<br />

In-plane lattice parameter a (Å) 8.354±0.002 8.346±0.002 8.348±0.003 8.366±0.001<br />

Out-of-plane lattice parameter c (Å) 8.338±0.001 8.343±0.001 8.342±0.001 8.318±0.001<br />

Saturation magnetization 4 MS (G) 3230 3280 3569 3757<br />

g factor 2.24±0.003 2.27±0.01 2.28±0.009 2.28±0.03<br />

2K1/MS (G) -75±15 -228±46 -272±38 -328±111<br />

4 Meff (G) 2348±14 2560±46 2883±38 889±108<br />

The line width of FMR resonance curve represents the degree of microwave loss which is<br />

an important concern for practical microwave device application. Nickel ferrite films deposited<br />

on MgAl2O4 at different temperatures were characterized by in plane FMR (static magnetic field<br />

pointing at [100] direction) at microwave frequency of 9.5 GHz. The as measured thin film<br />

thickness is in the range of (650~780 nm). As one can see in Fig.49, the FMR line width of film<br />

)

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