CHEMICAL VAPOR DEPOSITION OF THIN FILM MATERIALS FOR ...

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B28 1.07000000 B29 1.47000000 B30 1.07000000 B31 1.07000000 B32 1.07000000 B33 1.47000000 B34 1.07000000 B35 1.07000000 B36 1.07000000 A1 109.47121829 A2 109.47123134 A3 109.47121829 A4 109.47120255 A5 109.47120255 A6 109.47120255 A7 109.47123134 A8 109.47120255 A9 109.47120255 A10 109.47120255 D22 57.63966610 D23 53.51145130 D24 66.14384390 D25 -173.85614130 D26 -53.85614870 D27 -119.99798461 D28 67.09960684 D29 -172.90037837 D30 -52.90038577 D31 120.00200060 D32 65.84469999 D33 -174.15528521 D34 -54.15529261 Hf 0 LANL2DZ **** H C N 0 6-31+G(d,p) **** Hf 0 LANL2DZ D3 -59.67581539 D4 179.42741141 D5 -60.57257380 D6 59.42741881 D7 60.32419940 D8 59.78081838 D9 179.78083317 D10 -60.21917422 D11 59.88892443 D12 69.90242347 D13 -170.09756173 D14 -50.09756913 D15 -60.11109036 D16 -179.68318452 D17 -59.68316972 D18 60.31682288 D19 173.51146610 D20 177.63965870 D21 -62.36032651 133
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CHEMICAL VAPOR DEPOSITION OF THIN F
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ABSTRACT Chemical vapor deposition
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DEDICATION This dissertation is ded
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φ In-plane tilt angle of X-ray dif
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ACKNOWLEDGMENTS It is my pleasure t
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CONTENTS ABSTRACT .................
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3.2.1 Introduction ................
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LIST OF TABLES Table 1. Hafnium ami
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indicated by the complex FMR curve.
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Fig. 49. Ferromagnetic resonance cu
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growth rate, good step coverage and
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growth of thin film oxides due to t
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one can uniformly deliver precursor
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for the next reaction step as shown
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Fig. 3. Schematic of a typical dire
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is predominantly dependent on syste
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J r J A -D n b-n 0 δ n or for the
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surface passivation with certain in
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ay spectroscopy (EDS), Wavelength d
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incidence angle is larger than cert
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epresenting those characteristic ph
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1.2.3.3 X-ray Diffraction (XRD) X-r
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exhibit diffraction peaks in the no
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(nanometers to tens of nanometers),
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strongest absorption of microwave s
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pinch-off to indicate the lack of a
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coupling is from unbound ferrite-fe
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diffusion barrier material in micro
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Fig. 14. A cross sectional scanning
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In spite of the same spinel structu
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ferrites has been investigated exte
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systems is showed in Fig.18.[83] As
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precursor vaporization process, e.g
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CHAPTER 3. PLASMA ENHANCED ATOMIC L
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the initial surface chemistry for t
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delay time of 2 seconds between spe
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Kcal/mol respectively. The stronger
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negative slope) behavior in the pum
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the existence of both physisorbed a
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decomposition products (Hf-H) and g
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dried by ultra high purity N2 gas.
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pressure for XPS analysis is around
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Hf and N elements, incorporation of
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[150,151] This is a unique feature
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software. The thickness results are
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CHAPTER 4. DIRECT LIQUID INJECTION
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film growth region. The properties
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solution was accurately controlled
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size). For the rocking curve analys
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oxygen does not participate in the
Page 101 and 102: ecause vapor velocity cannot be cha
Page 103 and 104: Fig. 40. Cross-sectional view by fi
Page 105 and 106: the MgAl2O4 substrate confirms cube
Page 107 and 108: pattern. Fig.44(b) has diffraction
Page 109 and 110: We have used an AGM (Alternating Gr
Page 111 and 112: as derived equations for different
Page 113 and 114: deposited at 600˚C is the lowest.
Page 115 and 116: wave states degenerate with the FMR
Page 117 and 118: Fig. 53. ϕ-scan of nickel ferrite
Page 119 and 120: Surface roughness characterized by
Page 121 and 122: Fig. 56. X-ray diffraction θ-2θ c
Page 123 and 124: 4.4 Conclusion In summary, we have
Page 125 and 126: CHAPTER 5. DIRECT LIQUID INJECTION
Page 127 and 128: eaction zone of the tube furnace is
Page 129 and 130: Fig. 58. X-ray diffraction characte
Page 131 and 132: interface. This phenomenon probably
Page 133 and 134: 6.1 Conclusion CHAPTER 6. CONCLUSIO
Page 135 and 136: the temperature range of 600˚C to
Page 137 and 138: such as PMN-PT and PZN-PT. CVD proc
Page 139 and 140: [18]. L. S.-J. Peng, X. X. Xi, B. H
Page 141 and 142: [54]. B. O. Johansson, J. -E. Sundg
Page 143 and 144: [96]. J. D. Adam, S. V. Krishnaswam
Page 145 and 146: [136]. J. Zhao, V. Fuflyigin, F. Wa
Page 147 and 148: APPENDIX A: LabVIEW PROGRAM FOR PEA
Page 149 and 150: APPENDIX B: TDMAH MOLECULAR STRUCTU
Page 151: H 18 B19 2 A18 1 D17 H 18 B20 2 A19
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