CHEMICAL VAPOR DEPOSITION OF THIN FILM MATERIALS FOR ...

(BaTiO3) films on various lattice match substrates. For the deposition of nickel ferrite, anhydrous
Ni(acac)2 and Fe(acac)3 (acac = acetylacetonate) are used as precursor sources dissolved in N,N-
dimethyl formamide (DMF) for the DLI vaporizer system. Epitaxial nickel ferrite films of
stoichiometric composition are obtained in the temperature range of 500-800 ºC on both
MgO(100) and MgAl2O4(100). Film morphology is found to be dependent on the deposition
temperature with atomically smooth films being obtained for deposition temperature of 600 and
700 ºC. Magnetic measurements reveal an increase in the saturation magnetization for the films
with increasing growth temperature, which correlates well with the trend for improved epitaxial
growth. Nickel ferrite films deposited on MgAl2O4 (100) at 800ºC exhibit saturation
magnetization very close to the bulk value of 300 emu/cm 3 . Out-of-plane FMR measurement
shows the narrowest FMR line width of ~160 Oe for films deposited at 600˚C. For lithium ferrite
deposition, anhydrous Li(acac) and Fe(acac)3 are dissolved in DMF in a molar ratio of 1:5.
Epitaxial growth of lithium ferrite films on MgO(100) are observed in the temperature range of
500˚C to 800˚C. The as grown films show increasing saturation magnetization with increasing
deposition temperature due to the improved degree of crystal texture. For barium titanate thin
film deposition, Ba(hfa)2•tetraglyme and Ti(thd)2(OPr i )2 are dissolved in toluene in a molar ratio
of 1:1. Epitaxial growth of barium titanate on MgO(100) has been found at the temperature of
750˚C. Film with a thickness of ~500 nm has a relatively large roughness of ~20 nm. Small
amount of F elements, which exists in Ba-F bonds, has been detected in the thin film by XPS.
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