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A GEM Detector System for an Upgrade of the CMS Muon Endcaps

A GEM Detector System for an Upgrade of the CMS Muon Endcaps

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where we have a higher percentage <strong>of</strong> CF4 th<strong>an</strong> CO2. A more detailed study is underway <strong>for</strong> <strong>the</strong> effect <strong>of</strong> CF4<br />

gas in <strong>GEM</strong>s <strong>an</strong>d o<strong>the</strong>r detectors.<br />

4.4 Aval<strong>an</strong>che simulation<br />

The studies done here use “single-electron” aval<strong>an</strong>ches as also described in <strong>the</strong> paper[19]. We generate a stack<br />

<strong>of</strong> single electrons r<strong>an</strong>domly at a dist<strong>an</strong>ce <strong>of</strong> 250 µm in <strong>the</strong> z-direction, from <strong>the</strong> <strong>GEM</strong>. The pl<strong>an</strong>e lies in <strong>the</strong> x-y<br />

direction. The electron is given <strong>an</strong> initial energy <strong>of</strong> 0.1 eV <strong>an</strong>d a r<strong>an</strong>dom initial direction <strong>of</strong> motion. Then one<br />

<strong>of</strong> <strong>the</strong> processes listed above is selected at r<strong>an</strong>dom, weighed by <strong>the</strong>ir relative probability considering <strong>the</strong> electron<br />

energy at <strong>the</strong> time <strong>of</strong> <strong>the</strong> collision. An additional electron is added to <strong>the</strong> stack in case <strong>of</strong> Penning tr<strong>an</strong>sfer or<br />

ionization; <strong>the</strong> electron is removed from <strong>the</strong> stack in case it is attached or attempts to leave <strong>the</strong> drift medium. The<br />

process is repeated until <strong>the</strong> stack is exhausted.<br />

The total gain, Gtot which is <strong>the</strong> total number <strong>of</strong> electrons produced in <strong>the</strong> aval<strong>an</strong>che, differs from <strong>the</strong> measured<br />

or effective gain Geff because <strong>the</strong> latter is derived solely from <strong>the</strong> current in <strong>the</strong> <strong>an</strong>ode pl<strong>an</strong>e. Aval<strong>an</strong>che electrons<br />

which terminate on <strong>the</strong> <strong>GEM</strong> electrodes or insulator do not contribute to <strong>the</strong> <strong>an</strong>ode current <strong>an</strong>d henceGeff is always<br />

smaller th<strong>an</strong> Gtot. The “single-electron” aval<strong>an</strong>che simulation has been repeated at least 1000 times <strong>for</strong> varying<br />

<strong>GEM</strong> voltages <strong>an</strong>d Penning parameters. All simulations were per<strong>for</strong>med at st<strong>an</strong>dard temperature <strong>an</strong>d pressure, i.e.<br />

T0 = 293.15 K, P0 = 1atm = 760 Torr.<br />

Some <strong>of</strong> <strong>the</strong> primary electrons are lost due to attachment to <strong>the</strong> gas molecules (attachment loss) or to <strong>the</strong> metal<br />

(geometric loss). The losses due to attachment <strong>an</strong>d due to geometric losses c<strong>an</strong> be seen in Fig. 39. The attachment<br />

loss as expected is independent <strong>of</strong> <strong>the</strong> <strong>GEM</strong> potential difference, while <strong>the</strong> geometric losses decrease with increasing<br />

<strong>GEM</strong> potential (or higher electric field), as electrons are accelerated <strong>an</strong>d sucked into <strong>the</strong> <strong>GEM</strong> hole faster with<br />

increasing electric fields. This leads to lower geometric losses. The attachment loss is∼ 12% in this gas mixture.<br />

Figure 39: Loss rate <strong>for</strong> primary electrons <strong>for</strong> rp = 0.6. The losses occur due to attachment to <strong>the</strong> quencher gas<br />

molecules (left) <strong>an</strong>d due to <strong>the</strong> electrons hitting <strong>the</strong> surface <strong>of</strong> copper metal or polyimide walls (right)<br />

The electrons which make it into <strong>the</strong> <strong>GEM</strong> hole give rise to <strong>the</strong> aval<strong>an</strong>che. All <strong>of</strong> <strong>the</strong>se secondary electrons do<br />

not contribute to <strong>the</strong> signal as some are lost on hitting <strong>the</strong> walls <strong>of</strong> <strong>the</strong> polyimide or hitting <strong>the</strong> copper metal <strong>an</strong>d<br />

some are lost due to attachment to <strong>the</strong> gas molecules. The losses due to attachment <strong>an</strong>d due to geometric losses c<strong>an</strong><br />

be seen in Fig. 40. The geometric loss increases with increasing <strong>GEM</strong> potential because <strong>the</strong> electrons exiting <strong>the</strong><br />

hole are attracted back by <strong>the</strong> lower copper metal which is positive with respect to <strong>the</strong> upper copper metal plate.<br />

The secondary attachment loss reduces to ∼ 8% as <strong>the</strong> electrons gain energy inside <strong>the</strong> <strong>GEM</strong> hole due to <strong>the</strong> high<br />

electric field inside <strong>the</strong> hole.<br />

39

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