Films minces à base de Si nanostructuré pour des cellules ...

(a) Integrated population of excited emitters.
(b) PL spectra.
Variation of excited emitter population and maximum PL intensity with
in MLs with similar total thicknesses.
Figure 5.25:
t SiO2
tel-00916300, version 1 - 10 Dec 2013
of excited emitters shows the highest intensity. The emission intensities of these
MLs with similar total thicknesses follow a monotonous trend with N3 int while in the
experimental observations the 36(4/10) has higher emission than 70(4/3). Thus,
we can hardly guess a trend depending on sublayer thickness or total thickness or
pattern number since numerous factors inuence the emission intensity.
5.6 Modeling SRSO/SRSN MLs
It was seen in chapter 4 that most of the SRSO/SRSN MLs contain three peaks
whose origin was systematically investigated. However, the low energy peak (peak
1) was unattributed, and was suspected to be a contribution of interference phenomena
or other such geometrical optical eects. Besides, the inuence of sublayer
thicknesses and pattern thicknesses on the emission intensity was also investigated
experimentally but the inuence of possible optical eects were suspected. Therefore,
the two major issues on SRSO/SRSN MLs are similar to those in SRSO/SiO 2
MLs:
(i) Origin of low energy emission peak (peak 1).
(ii) Inuence of sublayer thickness and pattern numbers.
A detailed investigation in the previous sections on SRSO/SiO 2 MLs gives an
insight on the second issue that concerns the inuence of sublayer thickness, pattern
number, etc. on the emission intensity.
The analysis on the origin of emission from SRSO/SRSN MLs is a work in
progress and the rst results are discussed in this section. The curves are simulated
with an assumption that the emitters are located only within SRSO sublayers.
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