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Films minces à base de Si nanostructuré pour des cellules ...

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tel-00916300, version 1 - 10 Dec 2013<br />

Figure 2.17: Step 1 and 2 of ellipsometry mo<strong>de</strong>lling.<br />

Informations extracted in this thesis<br />

ˆ The refractive in<strong>de</strong>x of the thin lm material is known from which we can estimate<br />

the composition of the lm in terms of <strong>Si</strong> excess. Using this refractive<br />

in<strong>de</strong>x, <strong>Si</strong> excess in the material can also be evaluated by calculations involving<br />

Bruggeman eective medium approximation [Bruggeman 35]. Contrary to the<br />

FTIR technique, Bruggeman calculations account for the nucleated <strong>Si</strong> particles<br />

but do not consi<strong>de</strong>r the fraction of free unboun<strong>de</strong>d <strong>Si</strong> atoms or smaller<br />

agglomerates.<br />

ˆ The thickness of the sample is <strong>de</strong>termined to a good <strong>de</strong>gree of accuracy (

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