Asymmetric fluid-structure dynamics in nanoscale imprint lithography

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indicates that the analytical estimate of the torsional stiffness is very close to theactual stiffness of the one degree-of-freedom flexure.150125θ, microradian1007550250 0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.8 0.9 1time, sFigure 6.5 Angle of inclination from simulation results (solid line) andexperimental results (circles). Calibration set.2.52force, lb1.510.500 0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.8 0.9 1time, sFigure 6.6 Force due to fluid pressure from simulation results (solid line) andexperimental results (circles). Calibration set.87
Figure 6.6 shows that the force due to the squeeze film pressure follow thesame trend for the simulation and the experiments. The maximum force in theexperimental data was 1.75 lbs. The maximum force in the simulation was 1.35lbs. The relative difference between the two results is 23%, which is quitesignificant. This discrepancy could be due to several possibilities.First, compliance estimates for the mechanical system contribute todifference in the actual and expected forces. In the actual setup, there are certaincompliances that are not modeled, for example, the substrate is modeled as rigid,however, the chuck, which holds the chromium substrate has compliance.Second, there existed some topography due to macroscopic scratches on thechromium substrate. Since chromium is a fairly soft material, maintaining aclean, flat surface was extremely difficult. The third cause relates to the previousin that there were particles observed on the substrate and template surfaces underthe magnification of a microscope. These particles could not be eliminated due tohandling of these components. The combined effects of all these factors are notfully understood and more research is needed in this area.4000380036003400film thickness, nm32003000280026002400220020000 0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.8 0.9 1time, sFigure 6.7 Average film thicknesses from simulation results (solid line) andexperimental results (circles). Correlation set.88
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Asymmetric Fluid-StructureDynamics
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AcknowledgementsFirst of all, I wou
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Table of ContentsList of Tables ...
Page 9 and 10:
6.2.3 Control Software ............
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List of FiguresFigure 1.1 Optical m
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Figure 6.9 Force due to fluid press
Page 15 and 16:
The exponential escalation in the c
Page 17 and 18:
1.2.1 Optical Lithography Process O
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patterns to the desired specificati
Page 21 and 22:
1.3 STEP AND FLASH IMPRINT LITHOGRA
Page 23 and 24:
transferlayerwaferStep 1: Spin-coat
Page 25 and 26:
the etch barrier fluid has an infin
Page 27 and 28:
Researchers at the University of Te
Page 29 and 30:
stage development. Design requireme
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minimum and maximum base layer thic
Page 33 and 34:
square plate with fluid completely
Page 35 and 36:
7. The fluid is assumed incompressi
Page 37 and 38:
⎛ ∂ ⎞⎜τdz ⎟dxdy⎝+ τ
Page 39 and 40:
where V 1 and V 2 correspond to U 1
Page 41 and 42:
ddx⎛⎜h⎝3dp ⎞ ∂h⎟ = 12µ
Page 43 and 44:
dhdtLzhθh αh βxx αx = 0 x βFig
Page 45 and 46:
C2hhtanθ2 21= αxαxβxαxβ( ) (
Page 47 and 48:
⎛⎜ hD⎜⎝6C ⎞1tanθ⎟24µh
Page 49 and 50: at the plate edges. Freeland obtain
Page 51 and 52: For the case of 10 psi of pressure,
Page 53 and 54: are the same as the width of the tr
Page 55 and 56: orientation stages relative to the
Page 57 and 58: Wafer ChuckAir SolenoidMounting Pla
Page 59 and 60: The one degree-of-freedom template
Page 61 and 62: Figure 3.7 Initial and final desire
Page 63 and 64: 7645321Figure 3.8 Active stage prot
Page 65 and 66: Chapter 4: Real-Time Gap Sensing Vi
Page 67 and 68: R( λ)( 4πnd/ λ)2 2 −2αd−αd
Page 69 and 70: Rate Monitoring and is adapted for
Page 71 and 72: 10090807060PSD504030201000 500 1000
Page 73 and 74: the multi-imprint and active stage
Page 75 and 76: 5.2.2 Composite Stiffness and Dampi
Page 77 and 78: ( )2πR−1.5clamping length of 1.5
Page 79 and 80: 65actuator height, micron432100 0.1
Page 81 and 82: time marching is required to minimi
Page 83 and 84: 5.4 SQUEEZE FILM DYNAMICS OF INCLIN
Page 85 and 86: force, lb504540353025201510500 0.05
Page 87 and 88: improve upon these results by tunin
Page 89 and 90: Again, Figure 5.12 shows that a bas
Page 91 and 92: optically flat quartz plate coated
Page 93 and 94: optic probe was illuminated with a
Page 95 and 96: Figure 6.3 Screenshot of control so
Page 97 and 98: 6.3 EXPERIMENTAL PROCEDUREExperimen
Page 99: film thickness, nm40003800360034003
Page 103 and 104: similar. In Figures 6.7 and 6.8, th
Page 105 and 106: 500045004000film thickness, nm35003
Page 107 and 108: Figure 6.13 shows the force-time pl
Page 109 and 110: ⎛ n ⎞in the FFT that is not ind
Page 111 and 112: when measuring thin layers in the r
Page 113 and 114: is a major milestone. The next step
Page 115 and 116: 7.2.4 Control schemeThe ultimate go
Page 117 and 118: Assuming the liquid perfectly wets
Page 119 and 120: ase h (for a semi-circular notch,h
Page 121 and 122: Chou, S. Y., P .R. Krauss, and P. J
Page 123 and 124: Tripp, J. H. 1983. Surface roughnes
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Asymmetric fluid-structure dynamics in nanoscale imprint lithography

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