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Asymmetric fluid-structure dynamics in nanoscale imprint lithography

Asymmetric fluid-structure dynamics in nanoscale imprint lithography

Asymmetric fluid-structure dynamics in nanoscale imprint lithography

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Rate Monitor<strong>in</strong>g and is adapted for measur<strong>in</strong>g film thickness dur<strong>in</strong>g the squeezefilm experiments.Equation 4.2 is demonstrated for a simulated film with a thickness of 500nm. In Figure 4.2, the theoretical reflectivity is plotted as a function ofwavelength. The plot resembles an expand<strong>in</strong>g s<strong>in</strong>e wave. However, when thereflectivity is plotted as a function of wavenumber <strong>in</strong> Figure 4.3, it is clearly seenthat this is a periodic signal.10.80.60.40.2reflectivity0-0.2-0.4-0.6-0.8-1300 400 500 600 700 800 900 1000 1100wavelength, nmFigure 4.2 Normalized <strong>in</strong>tensity of a 500 nm film as a function of wavelength56

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