Asymmetric fluid-structure dynamics in nanoscale imprint lithography

200018001600base layer thickness, nm14001200100080060040020000 0.05 0.1 0.15 0.2 0.25 0.3 0.35 0.4 0.45 0.5time, sFigure 5.7 Base layer thickness corresponding to single s-curve actuationThe results from the simulation show that this system has very highdamping due to the etch barrier fluid as expected. With this type of actuation, thefinal base layer thickness at 0.5 seconds was approximately 440 nm while theimprinting force was nearly 25 lbs. However, the force is not significant until thelatter half of the simulation time interval. The end result is that very thin baselayers are not easily achieved with low actuation forces.A base layer of this thickness cannot be properly etched. However, toachieve thinner base layers with single s-curve position control, the actuationforce would be significantly larger since the force scales as 1h3 . In thefollowing section, an improved method of actuation is proposed that results inthinner base layers.71