Asymmetric fluid-structure dynamics in nanoscale imprint lithography

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1700160015001400film thickness, nm13001200110010009008007000 0.5 1 1.5time, sFigure 6.12 Film thickness during squeezing with five microns of downwardactuation. Spectrometer probe 1 (circles) and probe 2 (squares)6.4.4 Experimental Squeeze Film Force3.5be ,l rcfo32.521.510.510 µm/s7 µm/s6 µm/s5 µm/s0-0.50 0.5 1 1.5time, sFigure 6.13 Force due to fluid pressure from experimental results for varyingvalues of average approach velocity93
Figure 6.13 shows the force-time plot for four different instances ofmotion supplied by the actuators. In all of the cases, the actuators move for about1 second. This translates into a higher average approach velocity. In Figure 6.13,the maximum force due to the squeeze film pressure increases when the approachvelocity is higher. The force increases proportionally with the approach velocity,but since the film thickness of each case is different, this increase in Figure 6.13is not linear.6.5 OBSERVATIONS AND DISCREPANCIES6.5.1 Particle ContaminationAlthough the experiments were performed in a class 100 clean-room,particle contamination was a fundamental problem in achieving the desired thinfluid layers of 100 – 200 nm. During the course of the experimental work, itbecame evident that is would not be possible to eliminate all particles without anautomated process. Particles could be caused by manual handling of theexperimental components. Furthermore, the fluid itself may have particles. Thewater was filtered using 0.02-micron filters. This resulted in slight improvementsin the minimum attainable gaps. The substrate was placed under a microscopewith a magnification of 100× to detect particles. This was done immediately afterthe substrate and template were cleaned in a solution of acetone followed by anisopropyl alcohol rinse and a filtered air bath. A comparison with a clean wafer,i.e. one that was not previously handled, showed that any handling beyond amoving the wafer from its container to the imprinting machine would result inparticle contamination.94
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Asymmetric Fluid-StructureDynamics
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AcknowledgementsFirst of all, I wou
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Table of ContentsList of Tables ...
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6.2.3 Control Software ............
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List of FiguresFigure 1.1 Optical m
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Figure 6.9 Force due to fluid press
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The exponential escalation in the c
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1.2.1 Optical Lithography Process O
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patterns to the desired specificati
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1.3 STEP AND FLASH IMPRINT LITHOGRA
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transferlayerwaferStep 1: Spin-coat
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the etch barrier fluid has an infin
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Researchers at the University of Te
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stage development. Design requireme
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minimum and maximum base layer thic
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square plate with fluid completely
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7. The fluid is assumed incompressi
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⎛ ∂ ⎞⎜τdz ⎟dxdy⎝+ τ
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where V 1 and V 2 correspond to U 1
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ddx⎛⎜h⎝3dp ⎞ ∂h⎟ = 12µ
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dhdtLzhθh αh βxx αx = 0 x βFig
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C2hhtanθ2 21= αxαxβxαxβ( ) (
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⎛⎜ hD⎜⎝6C ⎞1tanθ⎟24µh
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at the plate edges. Freeland obtain
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For the case of 10 psi of pressure,
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are the same as the width of the tr
Page 55 and 56: orientation stages relative to the
Page 57 and 58: Wafer ChuckAir SolenoidMounting Pla
Page 59 and 60: The one degree-of-freedom template
Page 61 and 62: Figure 3.7 Initial and final desire
Page 63 and 64: 7645321Figure 3.8 Active stage prot
Page 65 and 66: Chapter 4: Real-Time Gap Sensing Vi
Page 67 and 68: R( λ)( 4πnd/ λ)2 2 −2αd−αd
Page 69 and 70: Rate Monitoring and is adapted for
Page 71 and 72: 10090807060PSD504030201000 500 1000
Page 73 and 74: the multi-imprint and active stage
Page 75 and 76: 5.2.2 Composite Stiffness and Dampi
Page 77 and 78: ( )2πR−1.5clamping length of 1.5
Page 79 and 80: 65actuator height, micron432100 0.1
Page 81 and 82: time marching is required to minimi
Page 83 and 84: 5.4 SQUEEZE FILM DYNAMICS OF INCLIN
Page 85 and 86: force, lb504540353025201510500 0.05
Page 87 and 88: improve upon these results by tunin
Page 89 and 90: Again, Figure 5.12 shows that a bas
Page 91 and 92: optically flat quartz plate coated
Page 93 and 94: optic probe was illuminated with a
Page 95 and 96: Figure 6.3 Screenshot of control so
Page 97 and 98: 6.3 EXPERIMENTAL PROCEDUREExperimen
Page 99 and 100: film thickness, nm40003800360034003
Page 101 and 102: Figure 6.6 shows that the force due
Page 103 and 104: similar. In Figures 6.7 and 6.8, th
Page 105: 500045004000film thickness, nm35003
Page 109 and 110: ⎛ n ⎞in the FFT that is not ind
Page 111 and 112: when measuring thin layers in the r
Page 113 and 114: is a major milestone. The next step
Page 115 and 116: 7.2.4 Control schemeThe ultimate go
Page 117 and 118: Assuming the liquid perfectly wets
Page 119 and 120: ase h (for a semi-circular notch,h
Page 121 and 122: Chou, S. Y., P .R. Krauss, and P. J
Page 123 and 124: Tripp, J. H. 1983. Surface roughnes
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Asymmetric fluid-structure dynamics in nanoscale imprint lithography

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