Asymmetric fluid-structure dynamics in nanoscale imprint lithography
Asymmetric fluid-structure dynamics in nanoscale imprint lithography
Asymmetric fluid-structure dynamics in nanoscale imprint lithography
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where A is the Hamaker constant (~ 10 -20 J), h avg is the average distance betweenthe plates (m), and P appplied is the applied pressure (Pa).Assum<strong>in</strong>g the applied pressures on the order of 1 psi, h avg is about 4 nm whenvan der Waals forces are on the same order as the pressures of <strong>in</strong>terest [Freeland2000]. Also, Moore documents that it has been agreed that molecular <strong>in</strong>fluencecan extend outward from a surface no more than 0.5 µ<strong>in</strong> (13 nm). A base layerthickness of approximately 100 nm, well above these limits of cont<strong>in</strong>uum <strong>fluid</strong>mechanics, justifies a few of the follow<strong>in</strong>g assumptions.In deriv<strong>in</strong>g the Reynolds equation, the assumptions that are to be made mustbe considered:1. Body forces are neglected, i.e. van der Waals forces.2. The pressure is constant through the thickness of the film. S<strong>in</strong>ce thethickness of the films considered here are about ten microns or smaller,while the length scales <strong>in</strong> the plane of the template are measured <strong>in</strong>∂pcentimeters, it is reasonable to assume that = 0 .∂z3. There is no slip at the boundaries. There has been much work on this andit is universally accepted [Cameron 1976].∂u4. The <strong>fluid</strong> is Newtonian, i.e. τ = µ . Shear stress is proportional to the∂zrate of shear stra<strong>in</strong>. This assumption is valid when the lubrication is <strong>in</strong> thebulk regime (m<strong>in</strong>imum film thickness above 10 nm).5. The flow is lam<strong>in</strong>ar. The Reynolds number based on gap height is lessthan one for the range of gap heights and velocities. Reh