Asymmetric fluid-structure dynamics in nanoscale imprint lithography
Asymmetric fluid-structure dynamics in nanoscale imprint lithography
Asymmetric fluid-structure dynamics in nanoscale imprint lithography
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improve upon these results by tun<strong>in</strong>g the s-curve profile. However, thisimprovement is marg<strong>in</strong>al and research efforts were focused <strong>in</strong>stead on other areas.base layer thickness, nm20001800160014001200100080060040020000 0.05 0.1 0.15 0.2 0.25 0.3 0.35 0.4 0.45 0.5time, sFigure 5.10 Base layer thickness correspond<strong>in</strong>g to double s-curve actuation5045403530force, lb25201510500 0.05 0.1 0.15 0.2 0.25 0.3 0.35 0.4 0.45 0.5time, sFigure 5.11 Force correspond<strong>in</strong>g to double s-curve actuation74