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Asymmetric fluid-structure dynamics in nanoscale imprint lithography

Asymmetric fluid-structure dynamics in nanoscale imprint lithography

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Chapter 6: Experimental Results6.1 INTRODUCTIONIn order to verify the validity of the numerical simulations andscientifically quantify the effects of the etch barrier layer on the <strong>dynamics</strong> of themechanical system, experiments were performed us<strong>in</strong>g the active stage prototype.The data collected dur<strong>in</strong>g the experiments <strong>in</strong>cluded: 1) the motor shaft encoderoutputs from each of three high-resolution DC micrometer actuators, 2) thedynamic force read<strong>in</strong>g from each of three quartz force sensors mounted <strong>in</strong> serieswith the actuators, and 3) gap sens<strong>in</strong>g/film thickness measurements at twolocations across the template. The follow<strong>in</strong>g sections discuss the process ofcollect<strong>in</strong>g this data and present the experimental results.6.2 EXPERIMENTAL SETUP6.2.1 Experimental Adaptations of the Active Stage Test BedS<strong>in</strong>ce a few of the subsystems of the active stage test bed have not beenfully implemented, a couple of adaptations were required to complete theexperiments and gather the necessary data. First, a wafer chuck system was notreadily available. In the active stage, the wafer chuck holds the sp<strong>in</strong>-coated waferdur<strong>in</strong>g the impr<strong>in</strong>t<strong>in</strong>g process and air solenoids pneumatically lift the wafertowards the template stage. Thus, a temporary hold<strong>in</strong>g device to approximate thesemblance of an actual wafer chuck was designed and used. This component hadto be stiff <strong>in</strong> the lateral directions and hold the substrate close to the templatesurface. It was designed to hold a 2.54 × 2.54 × 0.635 cm (1 × 1 × 1/4 <strong>in</strong>ch)77

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