Asymmetric fluid-structure dynamics in nanoscale imprint lithography

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Miller, R. E., P. Bischoff, R. Sumner, S. Bowler, W. Flack, and G. Fong. TheDevelopment of 157nm Small Field and Mid-Field MicroSteppers. SPIE 2000Annual International Symposium on Microlithography.Moore, D. F. 1965. A review of squeeze films. Wear 8:245-63.Moore, D. F. 1964. On the inclined non-inertial sinkage of a flat plate. J. FluidMech. 20(2):321-30.Muzio, E., P. Seidel, M. Mason, J. Canning, and Gil Sheldon. Lithography Costof Ownership Analysis Revision Number: 4.0 Revision Date: December 1999.www.sematech.org/public/resources/coo/index.htmParos, J.M. and L. Weisbord. 1965. How to design flexure hinges. MachineDesign No. T-27, pp. 151-156.Patir, N. and H. S. Cheng. 1978. An average flow model for determining theeffects of three-dimensional roughness on partial hydrodynamic lubrication. J.Lub. Technol. 100:12-17.Sakurai, K. and A. Iida. 1992. Fourier analysis of interference structure in x-rayspecular reflection from thin films. Jpn. J. Appl. Phys. 31:L113-L115.Sheats, J. and B. Smith. Microlithography: Science and Technology. New York:Marcel Dekker, 1998.Stulen, R.H. and D. W. Sweeney. 1999. Extreme Ultraviolet Lithography. IEEEJ. Quantum Electronics 35(5):694-699.Thompson, L. F., C. G. Willson, and M. J. Bowen. Introduction toMicrolithography, 2 nd Edition, ACS Professional Reference Book. Washington,D. C.: American Chemical Society, 1994.109
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Asymmetric Fluid-StructureDynamics
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AcknowledgementsFirst of all, I wou
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Table of ContentsList of Tables ...
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6.2.3 Control Software ............
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List of FiguresFigure 1.1 Optical m
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Figure 6.9 Force due to fluid press
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The exponential escalation in the c
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1.2.1 Optical Lithography Process O
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patterns to the desired specificati
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1.3 STEP AND FLASH IMPRINT LITHOGRA
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transferlayerwaferStep 1: Spin-coat
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the etch barrier fluid has an infin
Page 27 and 28:
Researchers at the University of Te
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stage development. Design requireme
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minimum and maximum base layer thic
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square plate with fluid completely
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7. The fluid is assumed incompressi
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⎛ ∂ ⎞⎜τdz ⎟dxdy⎝+ τ
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where V 1 and V 2 correspond to U 1
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ddx⎛⎜h⎝3dp ⎞ ∂h⎟ = 12µ
Page 43 and 44:
dhdtLzhθh αh βxx αx = 0 x βFig
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C2hhtanθ2 21= αxαxβxαxβ( ) (
Page 47 and 48:
⎛⎜ hD⎜⎝6C ⎞1tanθ⎟24µh
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at the plate edges. Freeland obtain
Page 51 and 52:
For the case of 10 psi of pressure,
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are the same as the width of the tr
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orientation stages relative to the
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Wafer ChuckAir SolenoidMounting Pla
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The one degree-of-freedom template
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Figure 3.7 Initial and final desire
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7645321Figure 3.8 Active stage prot
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Chapter 4: Real-Time Gap Sensing Vi
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R( λ)( 4πnd/ λ)2 2 −2αd−αd
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Rate Monitoring and is adapted for
Page 71 and 72: 10090807060PSD504030201000 500 1000
Page 73 and 74: the multi-imprint and active stage
Page 75 and 76: 5.2.2 Composite Stiffness and Dampi
Page 77 and 78: ( )2πR−1.5clamping length of 1.5
Page 79 and 80: 65actuator height, micron432100 0.1
Page 81 and 82: time marching is required to minimi
Page 83 and 84: 5.4 SQUEEZE FILM DYNAMICS OF INCLIN
Page 85 and 86: force, lb504540353025201510500 0.05
Page 87 and 88: improve upon these results by tunin
Page 89 and 90: Again, Figure 5.12 shows that a bas
Page 91 and 92: optically flat quartz plate coated
Page 93 and 94: optic probe was illuminated with a
Page 95 and 96: Figure 6.3 Screenshot of control so
Page 97 and 98: 6.3 EXPERIMENTAL PROCEDUREExperimen
Page 99 and 100: film thickness, nm40003800360034003
Page 101 and 102: Figure 6.6 shows that the force due
Page 103 and 104: similar. In Figures 6.7 and 6.8, th
Page 105 and 106: 500045004000film thickness, nm35003
Page 107 and 108: Figure 6.13 shows the force-time pl
Page 109 and 110: ⎛ n ⎞in the FFT that is not ind
Page 111 and 112: when measuring thin layers in the r
Page 113 and 114: is a major milestone. The next step
Page 115 and 116: 7.2.4 Control schemeThe ultimate go
Page 117 and 118: Assuming the liquid perfectly wets
Page 119 and 120: ase h (for a semi-circular notch,h
Page 121: Chou, S. Y., P .R. Krauss, and P. J
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