Asymmetric fluid-structure dynamics in nanoscale imprint lithography

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3.2.4 Force Sensing SystemIn order to characterize the forces during the squeezing or separationprocess, dynamic forces must be measured in real-time. Force sensors are placedin series with the DC Mike actuators and coupled to the flexure ring via universaljoints to prevent edge loading or bending moments. Consistent with the activestage design, these force sensors must be stiff in the lateral direction.PCB Piezotronics 208C02 piezoelectric quartz force sensors were usedto obtain force data. These piezoelectric force sensors can be used for dynamicforce measurements providing a fast response in both compression and tension.These sensors have a dynamic range of ±450 N, compression and tension.Furthermore, the stiffness of the sensors is comparable to solid steel, k = 1×10 9N/m.3.3 IMPLEMENTED DESIGNThe active stage kinematics or RPU stage is similar to the ideal RPBstage, which has been thoroughly analyzed using screw system theory. Figures3.8 and 3.9 show the active stage system prototype. This test bed can be used tostudy the effect of the etch barrier on the orientation alignment for passive,selectively compliant stages. Separation of the template from the UV-exposedetch barrier can also be studied using the active stage.49
7645321Figure 3.8 Active stage prototype, side viewThe active stage prototype consists of a rigid mounting structure (1),which is mounted to an optical table. The wafer chuck assembly (2) brings thewafer to within the motion range of the distributed flexure ring (3). The flexurering is connected to three quartz force sensors (5) via universal joints. The quartzforce sensors will measure the imprinting/squeezing force as well as theseparation force. A rigid inner ring (4) will hold the template orientation stage ora vacuum based template holding mechanism. The high-resolution actuators (7)are connected to the revolute joints (6).50
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Asymmetric Fluid-StructureDynamics
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AcknowledgementsFirst of all, I wou
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Table of ContentsList of Tables ...
Page 9 and 10:
6.2.3 Control Software ............
Page 11 and 12: List of FiguresFigure 1.1 Optical m
Page 13 and 14: Figure 6.9 Force due to fluid press
Page 15 and 16: The exponential escalation in the c
Page 17 and 18: 1.2.1 Optical Lithography Process O
Page 19 and 20: patterns to the desired specificati
Page 21 and 22: 1.3 STEP AND FLASH IMPRINT LITHOGRA
Page 23 and 24: transferlayerwaferStep 1: Spin-coat
Page 25 and 26: the etch barrier fluid has an infin
Page 27 and 28: Researchers at the University of Te
Page 29 and 30: stage development. Design requireme
Page 31 and 32: minimum and maximum base layer thic
Page 33 and 34: square plate with fluid completely
Page 35 and 36: 7. The fluid is assumed incompressi
Page 37 and 38: ⎛ ∂ ⎞⎜τdz ⎟dxdy⎝+ τ
Page 39 and 40: where V 1 and V 2 correspond to U 1
Page 41 and 42: ddx⎛⎜h⎝3dp ⎞ ∂h⎟ = 12µ
Page 43 and 44: dhdtLzhθh αh βxx αx = 0 x βFig
Page 45 and 46: C2hhtanθ2 21= αxαxβxαxβ( ) (
Page 47 and 48: ⎛⎜ hD⎜⎝6C ⎞1tanθ⎟24µh
Page 49 and 50: at the plate edges. Freeland obtain
Page 51 and 52: For the case of 10 psi of pressure,
Page 53 and 54: are the same as the width of the tr
Page 55 and 56: orientation stages relative to the
Page 57 and 58: Wafer ChuckAir SolenoidMounting Pla
Page 59 and 60: The one degree-of-freedom template
Page 61: Figure 3.7 Initial and final desire
Page 65 and 66: Chapter 4: Real-Time Gap Sensing Vi
Page 67 and 68: R( λ)( 4πnd/ λ)2 2 −2αd−αd
Page 69 and 70: Rate Monitoring and is adapted for
Page 71 and 72: 10090807060PSD504030201000 500 1000
Page 73 and 74: the multi-imprint and active stage
Page 75 and 76: 5.2.2 Composite Stiffness and Dampi
Page 77 and 78: ( )2πR−1.5clamping length of 1.5
Page 79 and 80: 65actuator height, micron432100 0.1
Page 81 and 82: time marching is required to minimi
Page 83 and 84: 5.4 SQUEEZE FILM DYNAMICS OF INCLIN
Page 85 and 86: force, lb504540353025201510500 0.05
Page 87 and 88: improve upon these results by tunin
Page 89 and 90: Again, Figure 5.12 shows that a bas
Page 91 and 92: optically flat quartz plate coated
Page 93 and 94: optic probe was illuminated with a
Page 95 and 96: Figure 6.3 Screenshot of control so
Page 97 and 98: 6.3 EXPERIMENTAL PROCEDUREExperimen
Page 99 and 100: film thickness, nm40003800360034003
Page 101 and 102: Figure 6.6 shows that the force due
Page 103 and 104: similar. In Figures 6.7 and 6.8, th
Page 105 and 106: 500045004000film thickness, nm35003
Page 107 and 108: Figure 6.13 shows the force-time pl
Page 109 and 110: ⎛ n ⎞in the FFT that is not ind
Page 111 and 112: when measuring thin layers in the r
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is a major milestone. The next step
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7.2.4 Control schemeThe ultimate go
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Assuming the liquid perfectly wets
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ase h (for a semi-circular notch,h
Page 121 and 122:
Chou, S. Y., P .R. Krauss, and P. J
Page 123 and 124:
Tripp, J. H. 1983. Surface roughnes
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Asymmetric fluid-structure dynamics in nanoscale imprint lithography

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